SCHEMBL21500849

SCHEMBL21500849

Cc1cc(OC(=O)c2c(I)ccc(I)c2I)cc(C)c1O

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 3/20 0.43
▸ CYP3A4 P08684 3/20 0.43
▸ HPGD P15428 3/20 0.43
▸ ALDH1A1 P00352 2/20 0.43
▸ MEN1 O00255 2/20 0.43
▸ ALOX15 P16050 1/20 0.43
▸ MAPK1 P28482 1/20 0.43
▸ HSD17B10 Q99714 1/20 0.43
▸ POLB P06746 1/20 0.42
▸ TTR P02766 1/20 0.35
▸ PTPN1 P18031 1/20 0.34
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ ESR1 P03372 2/20 0.33
▸ NR1H4 Q96RI1 1/20 0.32
▸ MAPT P10636 1/20 0.32
▸ NSD2 O96028 1/20 0.32
▸ CA1 P00915 1/20 0.31
▸ CA2 P00918 1/20 0.31
▸ NPC1 O15118 1/20 0.31
▸ CASP3 P42574 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500874 0.82 KMT2A (0.40) KMT2ACYP3A4HPGDALDH1A1MEN1
SCHEMBL21500851 0.81 MAPT (0.44) KMT2ACYP3A4HPGDALDH1A1MEN1
SCHEMBL22945093 0.80 CYP1A2 (0.38) KMT2ACYP3A4HPGDALDH1A1MEN1
SCHEMBL21500865 0.79 CYP3A4 (0.45) KMT2ACYP3A4HPGDALDH1A1MEN1
SCHEMBL21500862 0.79 KMT2A (0.47) KMT2ACYP3A4HPGDALDH1A1MEN1
SCHEMBL22945091 0.79 LMNA (0.48) KMT2AALDH1A1MEN1L3MBTL1MAPT
SCHEMBL22945088 0.77 LMNA (0.54) KMT2ACYP3A4ALDH1A1MEN1ALOX15
SCHEMBL21500892 0.77 MAPT (0.38) KMT2AHPGDMEN1ALOX15HSD17B10
SCHEMBL21500852 0.76 PSMG3 (0.35) KMT2ACYP3A4HPGDMEN1POLB
SCHEMBL21500854 0.75 SENP1 (0.33) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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