SCHEMBL21500862

SCHEMBL21500862

COc1cc(O)cc(OC(=O)c2c(I)ccc(I)c2I)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 4/20 0.47
▸ POLB P06746 1/20 0.47
▸ ESR1 P03372 1/20 0.41
▸ ESR2 Q92731 1/20 0.41
▸ MEN1 O00255 3/20 0.40
▸ MAPT P10636 2/20 0.40
▸ PTGES O14684 1/20 0.40
▸ CYP3A4 P08684 5/20 0.39
▸ HPGD P15428 4/20 0.39
▸ CALM1 P0DP23 1/20 0.39
▸ HSD17B10 Q99714 3/20 0.38
▸ MAPK1 P28482 2/20 0.38
▸ ALDH1A1 P00352 2/20 0.38
▸ ALOX15 P16050 1/20 0.38
▸ BACE1 P56817 1/20 0.37
▸ GABRA1 P14867 1/20 0.37
▸ GABRG2 P18507 1/20 0.37
▸ GABRB3 P28472 1/20 0.37
▸ GABRA3 P34903 1/20 0.37
▸ GABRA2 P47869 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500874 0.92 KMT2A (0.40) KMT2APOLBESR1ESR2MEN1
SCHEMBL21500865 0.88 CYP3A4 (0.45) KMT2APOLBESR1ESR2MEN1
SCHEMBL21500858 0.83 CA5A (0.43) KMT2APOLBESR1ESR2MEN1
SCHEMBL21500859 0.80 KMT2A (0.35) KMT2APOLBESR1ESR2MEN1
SCHEMBL21500899 0.79 CYP3A4 (0.51) KMT2APOLBESR1ESR2MEN1
SCHEMBL21500849 0.79 KMT2A (0.43) KMT2APOLBESR1MEN1MAPT
SCHEMBL21500892 0.78 MAPT (0.38) KMT2AESR1ESR2MEN1MAPT
SCHEMBL21500841 0.75 KMT2A (0.48) KMT2AESR1ESR2MEN1MAPT
SCHEMBL21500833 0.74 ESR2 (0.39) KMT2AESR1ESR2MEN1MAPT
SCHEMBL22945091 0.73 LMNA (0.48) KMT2AMEN1MAPTALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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