SCHEMBL21500858

SCHEMBL21500858

CC(=O)c1cc(O)cc(OC(=O)c2c(I)ccc(I)c2I)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA5A P35218 1/20 0.43
▸ KMT2A Q03164 5/20 0.37
▸ CYP3A4 P08684 3/20 0.37
▸ MEN1 O00255 2/20 0.37
▸ HPGD P15428 2/20 0.37
▸ ESR1 P03372 2/20 0.37
▸ ESR2 Q92731 2/20 0.37
▸ ALDH1A1 P00352 1/20 0.37
▸ ALOX15 P16050 1/20 0.37
▸ MAPK1 P28482 1/20 0.37
▸ HSD17B10 Q99714 1/20 0.37
▸ PTPN1 P18031 3/20 0.35
▸ PTPN11 Q06124 2/20 0.35
▸ POLB P06746 2/20 0.33
▸ CA12 O43570 1/20 0.33
▸ CA1 P00915 1/20 0.33
▸ CA2 P00918 1/20 0.33
▸ CA7 P43166 1/20 0.33
▸ CA9 Q16790 1/20 0.33
▸ CA14 Q9ULX7 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500874 0.87 KMT2A (0.40) KMT2ACYP3A4MEN1HPGDESR1
SCHEMBL21500865 0.86 CYP3A4 (0.45) KMT2ACYP3A4MEN1HPGDESR1
SCHEMBL21500859 0.85 KMT2A (0.35) KMT2ACYP3A4MEN1HPGDESR1
SCHEMBL21500862 0.83 KMT2A (0.47) KMT2ACYP3A4MEN1HPGDESR1
SCHEMBL21500888 0.78 ALDH1A1 (0.53) CYP3A4HPGDALDH1A1MAPK1MAPT
SCHEMBL21500899 0.77 CYP3A4 (0.51) KMT2ACYP3A4MEN1ESR1ESR2
SCHEMBL21500849 0.77 KMT2A (0.43) KMT2ACYP3A4MEN1HPGDESR1
SCHEMBL21500892 0.76 MAPT (0.38) KMT2AMEN1HPGDESR1ESR2
SCHEMBL21500902 0.75 MAOB (0.42) KMT2ACYP3A4HPGDALDH1A1ALOX15
SCHEMBL21500833 0.72 ESR2 (0.39) KMT2AMEN1ESR1ESR2HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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