SCHEMBL21500866

SCHEMBL21500866

O=C(Oc1ccc(C(F)(F)c2ccc(O)cc2)cc1)c1c(I)ccc(I)c1I

nearest known ligand 0.38

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ KIF11 P52732 2/20 0.37
▸ ELANE P08246 2/20 0.34
▸ PRSS1 P07477 1/20 0.34
▸ ACR P10323 1/20 0.34
▸ MAPT P10636 4/20 0.33
▸ TDP1 Q9NUW8 1/20 0.33
▸ L3MBTL1 Q9Y468 1/20 0.33
▸ MEN1 O00255 1/20 0.32
▸ LMNA P02545 1/20 0.32
▸ KMT2A Q03164 1/20 0.32
▸ TLR8 Q9NR97 1/20 0.32
▸ TLR7 Q9NYK1 1/20 0.32
▸ ESR1 P03372 1/20 0.32
▸ ESR2 Q92731 1/20 0.32
▸ GAA P10253 1/20 0.31
▸ XBP1 P17861 1/20 0.31
▸ NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500870 0.89 ESR1 (0.47) KIF11ELANEPRSS1ACRMAPT
SCHEMBL21500892 0.88 MAPT (0.38) ELANEMAPTTDP1MEN1LMNA
SCHEMBL21500856 0.86 ESR1 (0.44) ELANEPRSS1ACRMAPTTDP1
SCHEMBL21500833 0.84 ESR2 (0.39) KIF11ELANEMAPTTDP1MEN1
SCHEMBL21500860 0.84 ELANE (0.35) KIF11ELANEPRSS1ACRMAPT
SCHEMBL21500871 0.82 ESR1 (0.38) ELANEMAPTTDP1L3MBTL1MEN1
SCHEMBL21500885 0.81 ELANE (0.50) ELANEMAPTMEN1LMNAKMT2A
SCHEMBL21500825 0.80 ELANE (0.44) ELANEMAPTMEN1LMNAKMT2A
SCHEMBL21500839 0.80 MAPT (0.51) ELANEMAPTTDP1MEN1LMNA
SCHEMBL21500884 0.79 ELANE (0.52) ELANEMAPTMEN1LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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