SCHEMBL21500871

SCHEMBL21500871

CCC(C)(c1ccc(O)cc1)c1ccc(OC(=O)c2c(I)ccc(I)c2I)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ESR1 P03372 3/20 0.38
▸ ESR2 Q92731 3/20 0.38
▸ ALDH1A1 P00352 2/20 0.38
▸ CYP3A4 P08684 1/20 0.38
▸ ELANE P08246 5/20 0.37
▸ CHRM2 P08172 2/20 0.36
▸ BCHE P06276 1/20 0.36
▸ MAPT P10636 4/20 0.36
▸ TDP1 Q9NUW8 2/20 0.36
▸ L3MBTL1 Q9Y468 1/20 0.36
▸ PRTN3 P24158 2/20 0.34
▸ NPC1 O15118 1/20 0.33
▸ CASP3 P42574 1/20 0.33
▸ RAB9A P51151 1/20 0.33
▸ SMN1; SMN2 Q16637 1/20 0.33
▸ SENP8 Q96LD8 1/20 0.33
▸ SENP7 Q9BQF6 1/20 0.33
▸ SENP6 Q9GZR1 1/20 0.33
▸ NPSR1 Q6W5P4 1/20 0.33
▸ MIF P14174 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21500856 0.87 ESR1 (0.44) ESR1ESR2ALDH1A1CYP3A4ELANE
SCHEMBL21500892 0.84 MAPT (0.38) ESR1ESR2ELANEMAPTTDP1
SCHEMBL21500860 0.82 ELANE (0.35) ESR2ALDH1A1ELANECHRM2BCHE
SCHEMBL21500866 0.82 KIF11 (0.37) ESR1ESR2ELANEMAPTTDP1
SCHEMBL21500833 0.80 ESR2 (0.39) ESR1ESR2ELANEMAPTTDP1
SCHEMBL21500870 0.80 ESR1 (0.47) ESR1ESR2ELANEMAPTTDP1
SCHEMBL21500825 0.79 ELANE (0.44) ESR1ESR2ELANEMAPTNPC1
SCHEMBL21500885 0.77 ELANE (0.50) ESR1ESR2ELANEMAPTRAB9A
SCHEMBL21500839 0.76 MAPT (0.51) ELANEMAPTTDP1MEN1LMNA
SCHEMBL22945091 0.73 LMNA (0.48) ALDH1A1MAPTL3MBTL1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156916-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-26 — — US disclosed
US-20190324368-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
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