Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.64 |
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.64 |
| ▸ | HPGD | P15428 | 7/20 | 0.64 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.64 |
| ▸ | MAPT | P10636 | 6/20 | 0.64 |
| ▸ | MEN1 | O00255 | 6/20 | 0.64 |
| ▸ | HTT | P42858 | 1/20 | 0.64 |
| ▸ | LMNA | P02545 | 1/20 | 0.56 |
| ▸ | THRB | P10828 | 1/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | ERCC1 | P07992 | 1/20 | 0.46 |
| ▸ | FEN1 | P39748 | 1/20 | 0.46 |
| ▸ | ERCC4 | Q92889 | 1/20 | 0.46 |
| ▸ | CES2 | O00748 | 1/20 | 0.44 |
| ▸ | BCHE | P06276 | 1/20 | 0.44 |
| ▸ | CES1 | P23141 | 1/20 | 0.44 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29713407 | 1.00 | ALDH1A1 (0.64) | ALDH1A1KDM4EHPGDKMT2AMAPT | |
| SCHEMBL24943444 | 0.91 | ALDH1A1 (0.57) | ALDH1A1KDM4EHPGDKMT2AMAPT | |
| SCHEMBL2617101 | 0.88 | ALDH1A1 (0.57) | ALDH1A1KDM4EHPGDKMT2AMAPT | |
| SCHEMBL16073097 | 0.88 | ALDH1A1 (0.57) | ALDH1A1KDM4EHPGDKMT2AMAPT | |
| SCHEMBL20801131 | 0.87 | MPO (0.57) | ALDH1A1KDM4EHPGDKMT2AMAPT | |
| SCHEMBL24943440 | 0.85 | ALDH1A1 (0.55) | ALDH1A1KDM4EHPGDKMT2AMAPT | |
| SCHEMBL29368754 | 0.85 | ALDH1A1 (0.61) | ALDH1A1KDM4EHPGDKMT2AMAPT | |
| SCHEMBL64157 | 0.85 | ALDH1A1 (0.61) | ALDH1A1KDM4EHPGDKMT2AMAPT | |
| SCHEMBL28891823 | 0.85 | ALDH1A1 (0.54) | ALDH1A1KDM4EHPGDKMT2AMAPT | |
| SCHEMBL13741778 | 0.84 | ALDH1A1 (0.60) | ALDH1A1KDM4EHPGDKMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2267 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118567184-B | Epoxy resin positive photoresist based on alkali deactivation mechanism and preparation method thereof | 潍坊星泰克微电子材料有限公司 | 2024-10-29 | — | — | CN | claimed |
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| WO-2024045679-A1 | ZN-BASED ORGANIC COORDINATION NANOPARTICLES AND PREPARATION METHOD THEREFOR, PHOTORESIST COMPOSITION, AND USE THEREOF | 清华大学 | 2024-03-07 | — | — | WO | claimed |
| WO-2024046107-A1 | ZN-BASED ORGANICALLY-COORDINATED NANOPARTICLES, PHOTORESIST COMPOSITION, PREPARATION METHOD THEREFOR, AND USE THEREOF | 清华大学 | 2024-03-07 | — | — | WO | claimed |
| WO-2024046108-A1 | ZN-BASED ORGANIC COORDINATION NANOPARTICLE AND PREPARATION METHOD THEREFOR, PHOTORESIST COMPOSITION CONTAINING SAME, AND USE THEREOF | 清华大学 | 2024-03-07 | — | — | WO | claimed |
| WO-2023133943-A1 | CROSS-LINKED POLYAMIC ACID ESTER AND PREPARATION METHOD THEREFOR, POLYIMIDE COMPOSITION COMPRISING SAME, AND METHOD FOR PREPARING POLYIMIDE RESIN FILM | 深圳职业技术学院 | 2023-07-20 | — | — | WO | claimed |
| CN-116449651-A | Polyimide positive photoresist based on alkali deactivation mechanism | 潍坊星泰克微电子材料有限公司 | 2023-07-18 | — | — | CN | claimed |
| US-11675393-B2 | Display device | SAMSUNG DISPLAY CO., LTD. (KR) | 2023-06-13 | — | — | US | claimed |
| WO-2023101104-A1 | PHOTOCURABLE INK COMPOSITION AND OPTICAL PRINTING METHOD USING SAME | 울산과학기술원 | 2023-06-08 | — | — | WO | claimed |
| WO-2023082371-A1 | BOTTOM ANTI-REFLECTIVE COATING FOR DEEP ULTRAVIOLET LITHOGRAPHY, PREPARATION METHOD THEREFOR AND USE THEREOF | 上海新阳半导体材料股份有限公司 | 2023-05-19 | — | — | WO | claimed |
| EP-2334714-A1 | METHOD OF PHOTOCHEMICAL HYDROLYSIS-POLYCONDENSATION OF CROSS-LINKABLE CHROMOPHORES WITH STERIC HINDRANCE, CATALYSED BY A PHOTOGENERATED ACID, AND THE APPLICATIONS THEREOF | Centre National de la Recherche Scientifique - CNRS (FR) | 2011-06-22 | — | — | EP | claimed |
| WO-2010029273-A1 | METHOD OF PHOTOCHEMICAL HYDROLYSIS-POLYCONDENSATION OF CROSS-LINKABLE CHROMOPHORES WITH STERIC HINDRANCE, CATALYSED BY A PHOTOGENERATED ACID, AND THE APPLICATIONS THEREOF | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE - CNRS - (FR) | 2010-03-18 | — | — | WO | claimed |
| CN-100383666-C | Photoresist composition and method for forming photoresist pattern using the same | HYNIX SEMICONDUCTOR INC (KR) | 2008-04-23 | — | — | CN | claimed |
| CN-1619419-A | Photoresist composition and method for forming photoresist pattern using the same | HYNIX SEMICONDUCTOR INC (KR) | 2005-05-25 | — | — | CN | claimed |
| CN-1603952-A | Photoresist composition | HYNIX SEMICONDUCTOR INC (KR) | 2005-04-06 | — | — | CN | claimed |
| CN-1093645-C | Photoresist material and method for producing semiconductor constituted of corrosion resist picture thereof | NEC CORP (JP) | 2002-10-30 | — | — | CN | claimed |
| US-6235446-B1 | MIXTURE OF P-HYDROXYSTYRENE, ACRYLATED ESTER | JSR CORPORATION (JP) | 2001-05-22 | — | — | US | claimed |
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| CN-1227355-A | Photoresist material and method for producing semiconductor constituted of corrosion resist picture thereof | NEC CORP (JP) | 1999-09-01 | — | — | CN | claimed |
| US-5916728-A | RESIN WHICH IS CONVERTED TO ALKALI-SOLUBLE FROM ALKALI-INSOLUBLE OR ALKALI-SLIGHTLY SOLUBLE BY THE ACTION OF AN ACID, ACID GENERATOR AND TERTIARY AMINE COMPOUND HAVING AN ALIPHATIC HYDROXYL GROUP. | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-06-29 | — | — | US | claimed |