SCHEMBL21587501

SCHEMBL21587501

C=C(C)C(=O)OC1(C(CC)CC)CCCC1

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.35
ALDH1A1 P00352 2/20 0.33
THRB P10828 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25617285 0.89 ALDH1A1 (0.32) TSHRALDH1A1
SCHEMBL10457890 0.87 TSHR (0.36) TSHR
SCHEMBL4399277 0.85 TSHR (0.38) TSHRALDH1A1THRB
SCHEMBL4406132 0.83 TSHR (0.37) TSHRALDH1A1THRB
SCHEMBL296606 0.81 TSHR (0.39) TSHRTHRB
SCHEMBL47304 0.80 TSHR (0.38) TSHRALDH1A1
SCHEMBL685726 0.79 TSHR (0.37) TSHRALDH1A1
SCHEMBL686090 0.79 TSHR (0.37) TSHRALDH1A1
SCHEMBL685731 0.79 TSHR (0.37) TSHRALDH1A1
SCHEMBL13172057 0.78 TSHR (0.38) TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11156917-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2021-10-26 US disclosed
US-20190377261-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2019-12-12 US disclosed