Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 11/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.41 |
| ▸ | PARP10 | Q53GL7 | 2/20 | 0.40 |
| ▸ | PARP15 | Q460N3 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | PPARG | P37231 | 1/20 | 0.38 |
| ▸ | TACR1 | P25103 | 1/20 | 0.38 |
| ▸ | MTNR1B | P49286 | 7/20 | 0.38 |
| ▸ | HTR2C | P28335 | 1/20 | 0.38 |
| ▸ | HTR2B | P41595 | 1/20 | 0.38 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.38 |
| ▸ | SIRT5 | Q9NXA8 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL29224022 | 0.99 | MTNR1A (0.45) | MTNR1AMEN1KMT2APARP10PARP15 | |
| SCHEMBL1130685 | 0.87 | KMT2A (0.50) | MTNR1AMEN1KMT2APARP10PARP15 | |
| SCHEMBL27585843 | 0.85 | ALDH1A1 (0.51) | MTNR1AMEN1KMT2APARP10PARP15 | |
| SCHEMBL18470681 | 0.84 | IDH1 (0.43) | MTNR1AMEN1KMT2AMTNR1BEPHX1 | |
| SCHEMBL31506884 | 0.84 | ALDH1A1 (0.40) | MTNR1AALDH1A1TACR1MTNR1BSIRT5 | |
| SCHEMBL29503685 | 0.84 | MTNR1A (0.44) | MTNR1AMTNR1BHTR2CHTR2B | |
| SCHEMBL31414083 | 0.83 | KDM4E (0.41) | MTNR1AMEN1KMT2AKDM4EALDH1A1 | |
| SCHEMBL29503732 | 0.83 | MTNR1A (0.46) | MTNR1AMTNR1B | |
| SCHEMBL12903610 | 0.82 | EPHX1 (0.39) | MEN1KMT2AKDM4EALDH1A1GAA | |
| SCHEMBL29224023 | 0.82 | MTNR1A (0.43) | MTNR1AMEN1KMT2APARP10PARP15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 372 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101880352-A | Be used for multipolymer, its preparation method of gap filling material composition and be used for the gap filling material composition of antireflecting coating | KOREA KUMHO PETROCHEM CO LTD | 2010-11-10 | — | — | CN | claimed |
| US-7638388-B2 | Method of forming a pattern and method of manufacturing a capacitor using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-12-29 | — | — | US | claimed |
| US-20080124911-A1 | METHOD OF FORMING A PATTERN AND METHOD OF MANUFACTURING A CAPACITOR USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (JP) | 2008-05-29 | — | — | US | claimed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4679175-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM | Nissan Chemical Corporation (JP) | 2026-01-14 | — | — | EP | disclosed |
| US-20250377596-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-12-11 | — | — | US | disclosed |
| US-20250362609-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250361419-A1 | COMPOSITION FOR FORMING COATING FILM FOR REMOVING FOREIGN MATTERS AND SEMICONDUCTOR SUBSTRATE | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| US-20250355357-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-20 | — | — | US | disclosed |
| EP-1703328-A1 | COMPOSITION FOR FORMING NITRIDE COATING FILM FOR HARD MASK | Nissan Chemical Industries, Ltd. (JP) | 2006-09-20 | — | — | EP | disclosed |
| US-20060204891-A1 | Etching resistance; novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-09-14 | — | — | US | disclosed |
| CN-1830202-A | Composition for forming lower layer film for lithography comprising compound having protected carboxyl group | NISSAN CHEMICAL IND LTD (JP) | 2006-09-06 | — | — | CN | disclosed |
| EP-1662769-A1 | COMPOSITION FOR FORMING LOWER LAYER FILM FOR LITHOGRAPHY COMPRISING COMPOUND HAVING PROTECTED CARBOXYL GROUP | Nissan Chemical Industries, Ltd. (JP) | 2006-05-31 | — | — | EP | disclosed |
| CN-1774673-A | Porous underlayer film and underlayer film forming composition used for forming the same | NISSAN CHEMICAL IND LTD (JP) | 2006-05-17 | — | — | CN | disclosed |
| CN-1768306-A | Underlayer coating forming composition for lithography containing epoxy compound and carboxylic acid compound | NISSAN CHEMICAL IND LTD (JP) | 2006-05-03 | — | — | CN | disclosed |
| EP-1619555-A1 | POROUS UNDERLAYER FILM AND UNDERLAYER FILM FORMING COMPOSITION USED FOR FORMING THE SAME | Nissan Chemical Industries, Ltd. (JP) | 2006-01-25 | — | — | EP | disclosed |
| EP-1617289-A1 | COMPOSITION FOR FORMATION OF UNDERLAYER FILM FOR LITHOGRAPHY CONTAINING EPOXY COMPOUND AND CARBOXYLIC ACID COMPOUND | Nissan Chemical Industries, Ltd. (JP) | 2006-01-18 | — | — | EP | disclosed |
| EP-0373687-A1 | Method for the photochemical conversion of tachysterol compounds into previtamin D compounds and of trans-vitamin D compounds into cis-vitamin D compounds | DUPHAR INTERNATIONAL RESEARCH B.V (NL) | 1990-06-20 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | MTNR1A 3795/4885MEN1 2480/4885KMT2A 111/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | MTNR1A 3411/4885MEN1 1625/4885KMT2A 1145/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.