Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 4/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.32 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL28320731 | 0.90 | LMNA (0.32) | ALDH1A1HSD11B1HSD17B10 | |
| Methacrylic Acid SCHEMBL28271142 | 0.88 | ALDH1A1 (0.38) | ALDH1A1HSD11B1EPHX2EPHX1 | |
| SCHEMBL27645626 | 0.82 | HSD11B1 (0.37) | HSD11B1L3MBTL1HSD17B10 | |
| SCHEMBL1122469 | 0.79 | ALDH1A1 (0.39) | ALDH1A1HSD11B1EPHX2L3MBTL1 | |
| SCHEMBL28287126 | 0.77 | LMNA (0.35) | ALDH1A1L3MBTL1 | |
| SCHEMBL29117542 | 0.77 | HSD11B1 (0.37) | ALDH1A1HSD11B1EPHX2L3MBTL1 | |
| SCHEMBL13109005 | 0.74 | ALDH1A1 (0.37) | ALDH1A1 | |
| SCHEMBL5398462 | 0.74 | HSD11B1 (0.35) | HSD11B1EPHX2L3MBTL1HSD17B10CHRNB2 | |
| SCHEMBL6411363 | 0.74 | HSD11B1 (0.35) | ALDH1A1HSD11B1EPHX2L3MBTL1HSD17B10 | |
| SCHEMBL29117691 | 0.74 | TSHR (0.44) | ALDH1A1EPHX2L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104914673-B | Photosensitive polymer combination, photosensitive element, the forming method of resist pattern and touch panel manufacturing method | 日立化成株式会社 | 2019-12-03 | — | — | CN | claimed |
| US-10429029-B2 | Organic light emitting display device and method for fabricating the same | LG DISPLAY CO., LTD. (KR) | 2019-10-01 | — | — | US | claimed |
| CN-107493684-B | Photocurable composition | 三键有限公司 | 2019-08-30 | — | — | CN | claimed |
| US-7834113-B2 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-16 | — | — | US | claimed |
| EP-1465877-B1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA (US) | 2008-09-24 | — | — | EP | claimed |
| EP-1551886-B1 | FLUORINATED POLYMERS USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY | DU PONT (US) | 2008-09-10 | — | — | EP | claimed |
| EP-1960837-A2 | DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS | AZ Electronic Materials USA Corp. (US) | 2008-08-27 | — | — | EP | claimed |
| US-7312287-B2 | copolymer of ethylenically unsaturated monomer having one or more fluorine group and a polycyclic unsaturated monomer having one or more ester groups | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-12-25 | — | — | US | claimed |
| EP-1551886-A4 | FLUORINATED POLYMERS USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY | DU PONT (US) | 2007-11-14 | — | — | EP | claimed |
| WO-2007054813-A2 | DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-05-18 | — | — | WO | claimed |
| US-20070105040-A1 | Developable undercoating composition for thick photoresist layers | AZ ELECTRONIC MATERIALS USA CORP. | 2007-05-10 | — | — | US | claimed |
| US-20060247400-A1 | Photoresist compositions and processes for preparing the same | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2006-11-02 | — | — | US | claimed |
| US-20060166129-A1 | copolymer of ethylenically unsaturated monomer having one or more fluorine group and a polycyclic unsaturated monomer having one or more ester groups; coating, imagewise exposing the photoresist layer, developing | E. I. DU PONT DE NEMOURS AND COMPANY | 2006-07-27 | — | — | US | claimed |
| EP-1551886-A1 | FLUORINATED POLYMERS USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY | E.I. du Pont de Nemours and Company (US) | 2005-07-13 | — | — | EP | claimed |
| EP-1465877-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | Clariant International Ltd. (CH) | 2004-10-13 | — | — | EP | claimed |
| WO-2004016664-A1 | FLUORINATED POLYMERS USEFUL AS PHOTORESISTS, AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2004-02-26 | — | — | WO | claimed |
| WO-2003057678-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | CLARIANT INTERNATIONAL LTD (CH) | 2003-07-17 | — | — | WO | claimed |
| US-20030129531-A1 | Positive-working photoimageable bottom antireflective coating | MERCK PATENT GMBH (DE) | 2003-07-10 | — | — | US | claimed |
| CN-117666282-A | Non-film-forming matrix, photopolymer, film, preparation method and printing stock | 深圳幻臻技术有限公司 | 2024-03-08 | — | — | CN | disclosed |
| WO-2002069044-A2 | POLYMERS AND PHOTORESIST COMPOSITIONS | SHIPLEY COMPANY, L.L.C. (US) | 2002-09-06 | — | — | WO | disclosed |