Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29117542 | 0.86 | HSD11B1 (0.37) | ALDH1A1TSHRMAPTMAPK1L3MBTL1 | |
| SCHEMBL29117691 | 0.83 | TSHR (0.44) | ALDH1A1TSHRL3MBTL1EPHX2NPSR1 | |
| SCHEMBL216297 | 0.79 | ALDH1A1 (0.38) | ALDH1A1L3MBTL1HSD11B1EPHX2 | |
| SCHEMBL11297336 | 0.79 | EPHX2 (0.34) | ALDH1A1TSHRMAPTHSD11B1EPHX2 | |
| Adamantane SCHEMBL29167166 | 0.77 | THRB (0.52) | ALDH1A1TSHRMAPTLMNANPSR1 | |
| SCHEMBL27645626 | 0.77 | HSD11B1 (0.37) | L3MBTL1HSD11B1 | |
| SCHEMBL3947822 | 0.77 | MAPK1 (0.33) | MAPK1L3MBTL1LMNAHSD11B1EPHX2 | |
| SCHEMBL10150478 | 0.77 | PPM1B (0.44) | ALDH1A1TSHRMAPK1L3MBTL1LMNA | |
| SCHEMBL18045654 | 0.76 | HSD11B1 (0.47) | ALDH1A1TSHRMAPTMAPK1L3MBTL1 | |
| SCHEMBL29117558 | 0.75 | MAPK1 (0.36) | ALDH1A1MAPTMAPK1L3MBTL1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7834113-B2 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-16 | — | — | US | claimed |
| US-20060247400-A1 | Photoresist compositions and processes for preparing the same | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2006-11-02 | — | — | US | claimed |
| CN-116981758-A | Thermally responsive brush polymers having a copolymer backbone and copolymer arms | 英菲诺姆国际有限公司 | 2023-10-31 | — | — | CN | disclosed |
| US-11535691-B2 | Macromolecular material, method for producing same, and polymerizable monomer composition | OSAKA UNIVERSITY (JP) | 2022-12-27 | — | — | US | disclosed |
| US-20220169768-A1 | MACROMOLECULAR MATERIAL, METHOD FOR PRODUCING SAME, AND POLYMERIZABLE MONOMER COMPOSITION | OSAKA UNIVERSITY (JP) | 2022-06-02 | — | — | US | disclosed |
| CN-109071730-B | Polymer material, method for producing same, and polymerizable monomer composition | 国立大学法人大阪大学 | 2021-09-03 | — | — | CN | disclosed |
| WO-2021149432-A1 | METHOD FOR FORMING PATTERN, RADIATION-SENSITIVE COMPOSITION, AND CLATHRATE COMPOUND | JSR株式会社 | 2021-07-29 | — | — | WO | disclosed |
| US-20210155731-A1 | COMPOSITION FOR POLYMERIZATION, POLYMER OF SAME AND METHOD FOR PRODUCING POLYMER | OSAKA UNIVERSITY (JP) | 2021-05-27 | — | — | US | disclosed |
| WO-2020035960-A1 | METHOD FOR PURIFYING POLYMERIZABLE FLUOROMONOMER BY DISTILLATION | セントラル硝子株式会社 | 2020-02-20 | — | — | WO | disclosed |
| EP-2970538-A1 | POLYMERIZATION PROCESS PROTECTION MEANS | E. I. du Pont de Nemours and Company (US) | 2016-01-20 | — | — | EP | disclosed |
| WO-2014150700-A1 | POLYMERIZATION PROCESS PROTECTION MEANS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2014-09-25 | — | — | WO | disclosed |
| EP-1738897-A1 | OPTICAL FUNCTIONAL LAMINATE | Daikin Industries, Ltd. (JP) | 2007-01-03 | — | — | EP | disclosed |
| EP-1734074-A1 | PHOTOFUNCTIONAL OPTICAL MATERIAL COMPRISING FLUORINATED ACRYLATE POLYMER | Daikin Industries, Ltd. (JP) | 2006-12-20 | — | — | EP | disclosed |
| US-20060247400-A1 | Photoresist compositions and processes for preparing the same | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2006-11-02 | — | — | US | disclosed |
| WO-2006091375-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2006-08-31 | — | — | WO | disclosed |
| EP-1509551-A1 | PROCESS FOR PURIFICATION OF ALKOXYSTYRENE POLYMERS | Dupont Electronic Technologies L.P. (US) | 2005-03-02 | — | — | EP | disclosed |
| EP-1497339-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | Dupont Electronic Technologies L.P. (US) | 2005-01-19 | — | — | EP | disclosed |
| EP-1479700-A1 | Processes for preparing photoresist compositions | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2004-11-24 | — | — | EP | disclosed |
| WO-2003089480-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) | 2003-10-30 | — | — | WO | disclosed |
| WO-2003089481-A1 | PROCESS FPR PURIFICATION OF ALKOXYSTYRENE POLYMERS | DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) | 2003-10-30 | — | — | WO | disclosed |