SCHEMBL216423

SCHEMBL216423

CC(C)(C)OC(=O)C12CCC(CC1)C2

nearest known ligand 0.44

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.43
HTT P42858 2/20 0.43
NPSR1 Q6W5P4 1/20 0.43
CYP17A1 P05093 2/20 0.39
CYP19A1 P11511 2/20 0.39
KMT2A Q03164 2/20 0.35
MAPK1 P28482 2/20 0.35
MEN1 O00255 1/20 0.35
HSD11B1 P28845 3/20 0.33
EPHX2 P34913 2/20 0.33
SCN1A P35498 1/20 0.33
SCN2A Q99250 1/20 0.33
SCN3A Q9NY46 1/20 0.33
CHRM2 P08172 1/20 0.33
CHRM1 P11229 1/20 0.33
CHRM3 P20309 1/20 0.33
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30798137 0.84 CYP17A1 (0.46) ALDH1A1NPSR1CYP17A1CYP19A1KMT2A
SCHEMBL1409283 0.82 ALDH1A1 (0.39) ALDH1A1HTTNPSR1CYP17A1CYP19A1
SCHEMBL384254 0.81 ALDH1A1 (0.41) ALDH1A1HTTNPSR1CYP17A1CYP19A1
SCHEMBL5080907 0.80 CYP17A1 (0.41) NPSR1CYP17A1CYP19A1KMT2AMAPK1
SCHEMBL131064 0.80 CYP17A1 (0.55) ALDH1A1HTTNPSR1CYP17A1CYP19A1
SCHEMBL31181782 0.79 BTK (0.36) CYP17A1CYP19A1
SCHEMBL3704482 0.78 ALDH1A1 (0.42) ALDH1A1HTTNPSR1KMT2AMEN1
SCHEMBL2515948 0.77 ALDH1A1 (0.38) ALDH1A1HTTNPSR1KMT2AMEN1
SCHEMBL136663 0.77 NPSR1 (0.49) ALDH1A1NPSR1CYP17A1CYP19A1KMT2A
SCHEMBL7600486 0.75 ALDH1A1 (0.37) ALDH1A1HTTNPSR1KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1960837-A2 DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS AZ Electronic Materials USA Corp. (US) 2008-08-27 EP claimed
WO-2007054813-A2 DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2007-05-18 WO claimed
US-20070105040-A1 Developable undercoating composition for thick photoresist layers AZ ELECTRONIC MATERIALS USA CORP. 2007-05-10 US claimed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 US claimed
CN-117886814-A PD-1/PD-L1 small molecule inhibitor and application thereof in medicines 广东东阳光药业股份有限公司 2024-04-16 CN disclosed
EP-2384457-B1 COATING COMPOSITIONS MERCK PATENT GMBH (DE) 2022-07-06 EP disclosed
CN-110520168-B Soft polypropylene compositions with improved properties 北欧化工公司 2021-12-14 CN disclosed
CN-107428884-B Process for mixing an olefin polymer with reactants 博里利斯股份公司 2020-11-13 CN disclosed
CN-107075014-B Long chain branched polypropylene for membrane applications 博里利斯股份公司 2019-12-06 CN disclosed
EP-2718379-B1 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF MERCK PATENT GMBH (DE) 2016-08-17 EP disclosed
US-9146467-B2 Coating compositions MERCK PATENT GMBH (DE) 2015-09-29 US disclosed
EP-2718379-A1 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF AZ Electronic Materials USA Corp. (US) 2014-04-16 EP disclosed
WO-2007054813-A2 DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2007-05-18 WO disclosed
US-20070105040-A1 Developable undercoating composition for thick photoresist layers AZ ELECTRONIC MATERIALS USA CORP. 2007-05-10 US disclosed
US-6844131-B2 Positive-working photoimageable bottom antireflective coating CLARIANT FINANCE (BVI) LIMITED (VG) 2005-01-18 US disclosed
EP-1465877-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING Clariant International Ltd. (CH) 2004-10-13 EP disclosed
WO-2003057678-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 WO disclosed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 US disclosed
US-6492542-B2 CONTINUALLY ADDING AN ESTERIFICATION AGENT POSSESSING A MONOVALENT ACID GROUP, WHICH AGENT IS ESTER-INTERCHANGEABLE WITH A TERTIARY ALCOHOL, TO A MIXED FLUID OF A CARBOXYLIC ACID AND A TERTIARY ALCOHOL HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2002-12-10 US disclosed
EP-1182188-A2 Method for producing carboxylic acid tertiary alkyl ester Honshu Chemical Industry Co., Ltd. (JP) 2002-02-27 EP disclosed