⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27479400 | 0.80 | THRB (0.42) | — | |
| SCHEMBL10924048 | 0.80 | — | — | |
| SCHEMBL27529976 | 0.79 | MEN1 (0.35) | — | |
| SCHEMBL1314477 | 0.79 | TSHR (0.53) | — | |
| SCHEMBL7632208 | 0.77 | ALDH1A1 (0.50) | — | |
| SCHEMBL28407609 | 0.76 | EPHX1 (0.34) | — | |
| SCHEMBL27494684 | 0.76 | TSHR (0.41) | — | |
| SCHEMBL662137 | 0.75 | THRB (0.50) | — | |
| SCHEMBL28409892 | 0.74 | CHRNB2 (0.36) | — | |
| SCHEMBL27489035 | 0.74 | ALOX15 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9417526-B2 | Photoresist composition | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-08-16 | — | — | US | claimed |
| US-9335631-B2 | Photosensitive resin composition, method for manufacturing organic layer using the composition, and display device comprising the organic layer | SAMSUNG DISPLAY CO., LTD. (KR) | 2016-05-10 | — | — | US | claimed |
| US-20150205204-A1 | PHOTORESIST COMPOSITION | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-07-23 | — | — | US | claimed |
| US-20150168833-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR MANUFACTURING ORGANIC LAYER USING THE COMPOSITION, AND DISPLAY DEVICE COMPRISING THE ORGANIC LAYER | SAMSUNG DISPLAY CO., LTD (KR) | 2015-06-18 | — | — | US | claimed |
| EP-1960837-A2 | DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS | AZ Electronic Materials USA Corp. (US) | 2008-08-27 | — | — | EP | claimed |
| WO-2007054813-A2 | DEVELOPABLE UNDERCOATING COMPOSITION FOR THICK PHOTORESIST LAYERS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2007-05-18 | — | — | WO | claimed |
| US-20070105040-A1 | Developable undercoating composition for thick photoresist layers | AZ ELECTRONIC MATERIALS USA CORP. | 2007-05-10 | — | — | US | claimed |
| US-6465147-B1 | MIXING A PHOTORESIST POLYMER HAVING ONE OR MORE HYDROXYL GROUPS AND A CROSS-LINKER COMPOUND HAVING TWO OR MORE ALDEHYDE GROUPS IN THE PRESENCE OF A PHOTOACID GENERATOR TO PRODUCE A NEGATIVE PHOTORESIST COMPOSITION | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-10-15 | — | — | US | claimed |
| EP-0282069-A2 | Bicyclic aminocatalysts | RWE-DEA Aktiengesellschaft für Mineraloel und Chemie (DE) | 1988-09-14 | — | — | EP | claimed |
| US-20230082557-A1 | Modified Thioxanthone Photoinitiators | LINTFIELD LIMITED (GB) | 2023-03-16 | — | — | US | disclosed |
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | disclosed |
| US-20210277017-A1 | Thioxanthone Derivatives, Composition Comprising the Same and Pattern Forming Method Comprising Said Composition | LINTFIELD LIMITED (GB) | 2021-09-09 | — | — | US | disclosed |
| WO-2021144582-A1 | MODIFIED THIOXANTHONE PHOTOINITIATORS | LINTFIELD LIMITED (GB) | 2021-07-22 | — | — | WO | disclosed |
| EP-3824349-A1 | THIOXANTHONE DERIVATIVES, COMPOSITION COMPRISING THE SAME AND PATTERN FORMING METHOD COMPRISING SAID COMPOSITION | Lintfield Limited (GB) | 2021-05-26 | — | — | EP | disclosed |
| US-6844131-B2 | Positive-working photoimageable bottom antireflective coating | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-01-18 | — | — | US | disclosed |
| WO-2004102272-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND IMAGING PROCESS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-11-25 | — | — | WO | disclosed |
| EP-1465877-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | Clariant International Ltd. (CH) | 2004-10-13 | — | — | EP | disclosed |
| WO-2003057678-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | CLARIANT INTERNATIONAL LTD (CH) | 2003-07-17 | — | — | WO | disclosed |
| US-20030129531-A1 | Positive-working photoimageable bottom antireflective coating | MERCK PATENT GMBH (DE) | 2003-07-10 | — | — | US | disclosed |
| US-6465147-B1 | MIXING A PHOTORESIST POLYMER HAVING ONE OR MORE HYDROXYL GROUPS AND A CROSS-LINKER COMPOUND HAVING TWO OR MORE ALDEHYDE GROUPS IN THE PRESENCE OF A PHOTOACID GENERATOR TO PRODUCE A NEGATIVE PHOTORESIST COMPOSITION | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-10-15 | — | — | US | disclosed |