Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EDNRB | P24530 | 1/20 | 0.31 |
| ▸ | EDNRA | P25101 | 1/20 | 0.31 |
| ▸ | KDM1A | O60341 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL26327444 | 0.76 | KDM1A (0.46) | EDNRBEDNRAKDM1A | |
| SCHEMBL327743 | 0.67 | HTR2A (0.43) | KDM1A | |
| SCHEMBL29674239 | 0.67 | HTR2A (0.43) | KDM1A | |
| SCHEMBL26705154 | 0.67 | MAPK1 (0.36) | — | |
| Hydrochloric Acid SCHEMBL1952104 | 0.66 | HTR2A (0.42) | KDM1A | |
| SCHEMBL3542185 | 0.60 | ALDH1A1 (0.43) | — | |
| Hydrochloric Acid SCHEMBL9375331 | 0.60 | EDNRB (0.44) | EDNRBEDNRAKDM1A | |
| SCHEMBL26327443 | 0.58 | KDM1A (0.46) | KDM1A | |
| Hydrochloric Acid SCHEMBL5199073 | 0.57 | HTR2A (0.40) | EDNRBEDNRAKDM1A | |
| SCHEMBL12549679 | 0.57 | PARP10 (0.42) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11768434-B2 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-26 | — | — | US | disclosed |
| US-20200041903-A1 | POLYMER HAVING A STRUCTURE OF POLYAMIDE, POLYAMIDE-IMIDE, OR POLYIMIDE, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, PHOTOSENSITIVE DRY FILM, AND PROTECTIVE FILM FOR ELECTRIC AND ELECTRONIC PARTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-02-06 | — | — | US | disclosed |