Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | DRD1 | P21728 | 5/20 | 0.35 |
| ▸ | DRD5 | P21918 | 5/20 | 0.35 |
| ▸ | DRD2 | P14416 | 4/20 | 0.35 |
| ▸ | DRD4 | P21917 | 4/20 | 0.35 |
| ▸ | DRD3 | P35462 | 4/20 | 0.35 |
| ▸ | SRD5A1 | P18405 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.33 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.33 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21662882 | 0.80 | DRD1 (0.45) | MAPK1SMN1; SMN2DRD1DRD5DRD2 | |
| SCHEMBL7654995 | 0.71 | DRD2 (0.45) | MAPK1SMN1; SMN2DRD1DRD5DRD2 | |
| SCHEMBL24869495 | 0.70 | QDPR (0.43) | DRD2DRD3 | |
| SCHEMBL25323061 | 0.68 | CYP2D6 (0.32) | — | |
| SCHEMBL25323055 | 0.68 | CYP2D6 (0.32) | — | |
| Bromomethane SCHEMBL7768740 | 0.67 | ALDH1A1 (0.42) | MAPK1SMN1; SMN2DRD1DRD5DRD2 | |
| SCHEMBL21662877 | 0.67 | EDNRB (0.31) | — | |
| SCHEMBL7768742 | 0.65 | ALDH1A1 (0.40) | MAPK1SMN1; SMN2DRD1DRD5DRD2 | |
| SCHEMBL26705053 | 0.63 | ALDH1A1 (0.42) | MAPK1SMN1; SMN2DRD1DRD5DRD2 | |
| SCHEMBL18559550 | 0.61 | HTR2A (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230350294-A1 | Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-02 | — | — | US | disclosed |