Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DRD1 | P21728 | 5/20 | 0.45 |
| ▸ | DRD5 | P21918 | 5/20 | 0.45 |
| ▸ | DRD2 | P14416 | 4/20 | 0.45 |
| ▸ | DRD4 | P21917 | 4/20 | 0.45 |
| ▸ | DRD3 | P35462 | 4/20 | 0.45 |
| ▸ | KDM1A | O60341 | 1/20 | 0.45 |
| ▸ | SIGMAR1 | Q99720 | 5/20 | 0.43 |
| ▸ | EBP | Q15125 | 1/20 | 0.43 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.42 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7654995 | 0.89 | DRD2 (0.45) | DRD1DRD5DRD2DRD4DRD3 | |
| Bromomethane SCHEMBL7768740 | 0.84 | ALDH1A1 (0.42) | DRD1DRD5DRD2DRD4DRD3 | |
| SCHEMBL7768742 | 0.81 | ALDH1A1 (0.40) | DRD1DRD5DRD2DRD4DRD3 | |
| SCHEMBL26705154 | 0.80 | MAPK1 (0.36) | DRD1DRD5DRD2DRD4DRD3 | |
| SCHEMBL18559550 | 0.76 | HTR2A (0.39) | — | |
| SCHEMBL26705053 | 0.75 | ALDH1A1 (0.42) | DRD1DRD5DRD2DRD4DRD3 | |
| SCHEMBL17014512 | 0.73 | SIGMAR1 (0.44) | SIGMAR1EBPMAPK1SMN1; SMN2 | |
| SCHEMBL28130033 | 0.72 | ALDH1A1 (0.44) | DRD1DRD5DRD2DRD4DRD3 | |
| SCHEMBL9375592 | 0.71 | SIGMAR1 (0.41) | DRD2SIGMAR1EBPMAPK1SMN1; SMN2 | |
| SCHEMBL20618801 | 0.70 | ALDH1A1 (0.43) | DRD1DRD5DRD2DRD4DRD3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230350294-A1 | Negative Photosensitive Resin Composition, Patterning Process, Interlayer Insulating Film, Surface Protection Film, And Electronic Component | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-02 | — | — | US | disclosed |
| US-11768434-B2 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-26 | — | — | US | disclosed |
| US-11768434-B2 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-26 | — | — | US | disclosed |
| US-20200041903-A1 | POLYMER HAVING A STRUCTURE OF POLYAMIDE, POLYAMIDE-IMIDE, OR POLYIMIDE, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, PHOTOSENSITIVE DRY FILM, AND PROTECTIVE FILM FOR ELECTRIC AND ELECTRONIC PARTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-02-06 | — | — | US | disclosed |