Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL5470175 | 0.98 | ALDH1A1 (0.31) | ALDH1A1L3MBTL1 | |
| Dimethylamine SCHEMBL18008596 | 0.94 | — | — | |
| Allylamine SCHEMBL18008785 | 0.85 | ALDH1A1 (0.31) | ALDH1A1 | |
| Pyridine SCHEMBL18008140 | 0.84 | TSHR (0.30) | — | |
| SCHEMBL18008240 | 0.82 | — | — | |
| SCHEMBL3139960 | 0.82 | TP53 (0.32) | ALDH1A1L3MBTL1 | |
| Pyrogallol SCHEMBL28380302 | 0.81 | CA1 (0.38) | ALDH1A1 | |
| SCHEMBL14775259 | 0.80 | — | — | |
| SCHEMBL3128996 | 0.79 | TP53 (0.38) | — | |
| SCHEMBL9169466 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 121 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8088566-B2 | Photoresists; using compound containing an orgaooxygen or organosulfur compound | FUJIFILM CORPORATION (JP) | 2012-01-03 | — | — | US | claimed |
| US-20260133489-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-05-14 | — | — | US | disclosed |
| CN-122018230-A | Photosensitive resin composition, photosensitive resin layer, and semiconductor device using the photosensitive resin layer | 三星SDI株式会社 | 2026-05-12 | — | — | CN | disclosed |
| US-20260063996-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-03-05 | — | — | US | disclosed |
| US-20260062515-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER, AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-03-05 | — | — | US | disclosed |
| US-20260003271-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER, AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO LTD (KR) | 2026-01-01 | — | — | US | disclosed |
| US-20250291248-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | SAMSUNG SDI CO., LTD. (KR) | 2025-09-18 | — | — | US | disclosed |
| CN-112771447-B | Positive photosensitive resin composition, photosensitive resin film using the same, and electronic device | 三星SDI株式会社 | 2025-06-03 | — | — | CN | disclosed |
| US-20250020997-A1 | PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2025-01-16 | — | — | US | disclosed |
| US-12084592-B2 | Coating composition for pattern inversion | NISSAN CHEMICAL CORPORATION (JP) | 2024-09-10 | — | — | US | disclosed |
| EP-1690685-A2 | Planographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-16 | — | — | EP | disclosed |
| EP-1676835-A1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2005-10-20 | — | — | US | disclosed |
| US-20050020710-A1 | Hybrid onium salt | WAKO PURE CHEMICALS INDUSTRIES, LTD. (JP) | 2005-01-27 | — | — | US | disclosed |
| US-20040247900-A1 | Antireflective film material, and antireflective film and pattern formation method using the same | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2004-12-09 | — | — | US | disclosed |
| EP-1481973-A1 | HETEROCYCLE-BEARING ONIUM SALTS | Wako Pure Chemical Industries, Ltd. (JP) | 2004-12-01 | — | — | EP | disclosed |
| EP-1443042-A1 | HYBRID ONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-6599922-B2 | Process for the preparation of 2,5-bis-(2,2,2-trifluoroethoxy)-N-(2-piperidylmethyl)-benzamide (FLECAINIDE) | A.M.S.A. ANONIMA MATERIE SINTETICHE E AFFINI S.P.A. (IT) | 2003-07-29 | — | — | US | disclosed |
| US-20030032835-A1 | Antiarrhythmia agents | A.M.S.A. ANONIMA MATERIE SINTETICHE E AFFINI S.P.A (IT) | 2003-02-13 | — | — | US | disclosed |
| EP-1283201-A1 | Process for the preparation of 2,5-bis-(2,2,2-trifluoroethoxy)-n-(2-piperidyl-methyl)-benzamide (flecanide) | A.M.S.A. ANONIMA MATERIE SINTETICHE E AFFINI S.p.A. (IT) | 2003-02-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050233253-A1 | Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether | NOX4, CBR1, CBR3 | ALDH1A1 1190/4885L3MBTL1 4079/4885 |
| US-20260003271-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER, AND SEMICONDUCTOR DEVICE USING THE SAME | KDM1A, KDM2A, KDM3A | ALDH1A1 347/4885L3MBTL1 1566/4885 |
| US-20260133489-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | ASH2L, RER1, ARCN1 | ALDH1A1 1071/4885L3MBTL1 2981/4885 |
| US-20260062515-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER, AND SEMICONDUCTOR DEVICE USING THE SAME | RPS4Y1, ASH2L, KDM4D | ALDH1A1 1209/4885L3MBTL1 2477/4885 |
| US-20260063996-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER AND SEMICONDUCTOR DEVICE USING THE SAME | ASH2L, FCER2, TAS1R2 | ALDH1A1 939/4885L3MBTL1 2396/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.