SCHEMBL2168091

SCHEMBL2168091

CC(=O)CC(=O)OC(C)CC1C2CC3CC(C2)CC1C3

nearest known ligand 0.42

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 2/20 0.37
EPHX2 P34913 6/20 0.35
MGAM O43451 1/20 0.34
GAA P10253 1/20 0.34
SI P14410 1/20 0.34
MGAM2 Q2M2H8 1/20 0.34
TDP1 Q9NUW8 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.32
CTSL P07711 1/20 0.31
CTSB P07858 1/20 0.31
CTSK P43235 1/20 0.31
EPHX1 P07099 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2167749 0.78 HSD11B1 (0.37) HSD11B1EPHX2CTSKEPHX1
SCHEMBL1820168 0.78 HSD11B1 (0.37) HSD11B1EPHX2
SCHEMBL5097823 0.75 HSD11B1 (0.37) HSD11B1EPHX2
SCHEMBL16591038 0.73 HSD11B1 (0.35) HSD11B1EPHX2L3MBTL1EPHX1
SCHEMBL2168419 0.73 HSD11B1 (0.33) HSD11B1
SCHEMBL8751683 0.69 MGAM (0.50) EPHX2MGAMGAASIMGAM2
SCHEMBL28470696 0.69 EPHX1 (0.45) HSD11B1EPHX2MGAMGAASI
SCHEMBL182320 0.69 MGAM (0.55) MGAMGAASIMGAM2TDP1
SCHEMBL29438274 0.69 MGAM (0.55) MGAMGAASIMGAM2TDP1
SCHEMBL18026483 0.68 MGAM (0.48) MGAMGAASIMGAM2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8507174-B2 Positive resist composition, pattern forming method using the composition, and compound for use in the composition FUJIFILM CORPORATION (JP) 2013-08-13 US disclosed
EP-2450746-A1 Positive resist composition and pattern forming method using the composition Fujifilm Corporation (JP) 2012-05-09 EP disclosed
US-20110183258-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-07-28 US disclosed
EP-2177506-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND USED IN THE COMPOSITION Fujifilm Corporation (JP) 2010-04-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110183258-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION CROCC, ACTR2, MRE11 HSD11B1 4389/4885EPHX2 2149/4885MGAM 4424/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.