SCHEMBL2167749

SCHEMBL2167749

CC(=O)C(C)C(=O)OC(C)CC1C2CC3CC(C2)CC1C3

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.37
EPHX2 P34913 2/20 0.35
CTSK P43235 1/20 0.31
CA2 P00918 1/20 0.31
EPHX1 P07099 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1820168 0.78 HSD11B1 (0.37) HSD11B1EPHX2
SCHEMBL2168091 0.78 HSD11B1 (0.37) HSD11B1EPHX2CTSKEPHX1
SCHEMBL5097823 0.75 HSD11B1 (0.37) HSD11B1EPHX2
SCHEMBL16591038 0.73 HSD11B1 (0.35) HSD11B1EPHX2EPHX1
SCHEMBL2168419 0.73 HSD11B1 (0.33) HSD11B1
SCHEMBL2167435 0.66 HSD11B1 (0.41) HSD11B1EPHX2
SCHEMBL12406391 0.65 HSD11B1 (0.47) HSD11B1EPHX2
SCHEMBL19017773 0.65 HSD11B1 (0.44) HSD11B1EPHX2
SCHEMBL2117228 0.64 HSD11B1 (0.35) HSD11B1
SCHEMBL27914734 0.64 HSD11B1 (0.35) HSD11B1EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8507174-B2 Positive resist composition, pattern forming method using the composition, and compound for use in the composition FUJIFILM CORPORATION (JP) 2013-08-13 US disclosed
EP-2450746-A1 Positive resist composition and pattern forming method using the composition Fujifilm Corporation (JP) 2012-05-09 EP disclosed
US-20110183258-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-07-28 US disclosed
EP-2177506-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND USED IN THE COMPOSITION Fujifilm Corporation (JP) 2010-04-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110183258-A1 POSITIVE RESIST COMPOSITION, PATTERN FORMING METHOD USING THE COMPOSITION, AND COMPOUND FOR USE IN THE COMPOSITION CROCC, ACTR2, MRE11 HSD11B1 4389/4885EPHX2 2149/4885CTSK 1883/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.