Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARP15 | Q460N3 | 1/20 | 0.32 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.32 |
| ▸ | PARP2 | Q9UGN5 | 1/20 | 0.32 |
| ▸ | KDM4C | Q9H3R0 | 2/20 | 0.31 |
| ▸ | LPL | P06858 | 1/20 | 0.31 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.31 |
| ▸ | NOTUM | Q6P988 | 1/20 | 0.31 |
| ▸ | KDM5B | Q9UGL1 | 1/20 | 0.30 |
| ▸ | KDM5A | P29375 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1389367 | 0.88 | — | — | |
| SCHEMBL702949 | 0.82 | NR1H4 (0.38) | PARP15PARP10PARP2 | |
| SCHEMBL2456726 | 0.82 | NR1H4 (0.38) | PARP15PARP10PARP2 | |
| SCHEMBL3722748 | 0.82 | GRIK1 (0.46) | — | |
| SCHEMBL10010079 | 0.79 | PARP10 (0.45) | PARP15PARP10PARP2 | |
| SCHEMBL1073031 | 0.76 | ESR1 (0.38) | KDM4CLIPGNOTUMKDM5BKDM5A | |
| SCHEMBL14659393 | 0.74 | NOTUM (0.38) | KDM4CLIPGNOTUMKDM5BKDM5A | |
| SCHEMBL6049060 | 0.73 | NR1H4 (0.38) | PARP15PARP10PARP2 | |
| SCHEMBL2456728 | 0.72 | DRD2 (0.44) | PARP15PARP10PARP2 | |
| SCHEMBL28165784 | 0.72 | ALDH1A1 (0.44) | KDM4C |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12098298-B2 | Ultra-fast UV-cured material for repairing surface imperfections | ILLINOIS TOOL WORKS INC. (US) | 2024-09-24 | — | — | US | claimed |
| US-8304117-B2 | Comprises bismaleimide oligomer formed by reaction of barbituric acid and bismaleimide | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2012-11-06 | — | — | US | claimed |
| US-20080160404-A1 | Gel polymer electrolyte precursor and rechargeable cell comprising the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE | 2008-07-03 | — | — | US | claimed |
| US-20060135705-A1 | melting at least a portion of pellets or powder, the portion comprising a mixture of a functionalized polymer and a reactive monomer andflowing the molten portion into contact with the portion of the electronic or optical device | GENERAL ELECTRIC COMPANY | 2006-06-22 | — | — | US | claimed |
| EP-1373339-B1 | SHAPE MEMORY STYRENE COPOLYMER | JOHNSON & JOHNSON VISION CARE (US) | 2006-01-18 | — | — | EP | claimed |
| US-12098298-B2 | Ultra-fast UV-cured material for repairing surface imperfections | ILLINOIS TOOL WORKS INC. (US) | 2024-09-24 | — | — | US | disclosed |
| CN-110804276-A | High-resolution photocuring three-dimensional printing compound | 南京大学 | 2020-02-18 | — | — | CN | disclosed |
| US-9409793-B2 | Spin coatable metallic hard mask compositions and processes thereof | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2016-08-09 | — | — | US | disclosed |
| US-9212244-B2 | Polymers made from mixtures comprising vinyl ether monomers | MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) | 2015-12-15 | — | — | US | disclosed |
| US-9146467-B2 | Coating compositions | MERCK PATENT GMBH (DE) | 2015-09-29 | — | — | US | disclosed |
| US-20150200090-A1 | SPIN COATABLE METALLIC HARD MASK COMPOSITIONS AND PROCESSES THEREOF | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (US) | 2015-07-16 | — | — | US | disclosed |
| US-20130236833-A1 | COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-09-12 | — | — | US | disclosed |
| US-20080160404-A1 | Gel polymer electrolyte precursor and rechargeable cell comprising the same | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE | 2008-07-03 | — | — | US | disclosed |
| US-20070292809-A1 | Process for the Production of Double-Layer Heat-Sensitive Imageable Elements | KODAK POLYCHROME GRAPHICS, GMBH (DE) | 2007-12-20 | — | — | US | disclosed |
| US-20070286962-A1 | Methods for producing non-glossy coatings from radiation curable compositions | PPG INDUSTRIES OHIO, INC. | 2007-12-13 | — | — | US | disclosed |
| US-7297370-B2 | melting at least a portion of pellets or powder, the portion comprising a mixture of a functionalized polymer and a reactive monomer andflowing the molten portion into contact with the portion of the electronic or optical device | GENERAL ELECTRIC COMPANY (US) | 2007-11-20 | — | — | US | disclosed |
| EP-1673222-A1 | PROCESS FOR PRODUCTION OF HEAT-SENSITIVE IMAGEABLE ELEMENTS | Kodak Polychrome Graphics GmbH (DE) | 2006-06-28 | — | — | EP | disclosed |
| US-20060135704-A1 | Tack free compositions useful for electronic encapsulation | GENERAL ELECTRIC COMPANY | 2006-06-22 | — | — | US | disclosed |
| US-20060135705-A1 | melting at least a portion of pellets or powder, the portion comprising a mixture of a functionalized polymer and a reactive monomer andflowing the molten portion into contact with the portion of the electronic or optical device | GENERAL ELECTRIC COMPANY | 2006-06-22 | — | — | US | disclosed |
| WO-2005039878-A1 | PROCESS FOR PRODUCTION OF HEAT-SENSITIVE IMAGEABLE ELEMENTS | KODAK POLYCHROME GRAPHICS GMBH (DE) | 2005-05-06 | — | — | WO | disclosed |