Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HRH3 | Q9Y5N1 | 4/20 | 0.49 |
| ▸ | SLC29A1 | Q99808 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | DRD3 | P35462 | 1/20 | 0.42 |
| ▸ | HTR4 | Q13639 | 3/20 | 0.40 |
| ▸ | GLA | P06280 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21705754 | 0.89 | KMT2A (0.50) | SLC29A1ALDH1A1HTR4GLACYP3A4 | |
| SCHEMBL21705615 | 0.88 | HRH3 (0.48) | HRH3SLC29A1ALDH1A1DRD3HTR4 | |
| SCHEMBL21705213 | 0.88 | KMT2A (0.52) | ALDH1A1HTR4GLACYP3A4KMT2A | |
| SCHEMBL21783773 | 0.87 | HRH3 (0.39) | HRH3SLC29A1ALDH1A1HTR4GLA | |
| SCHEMBL21705199 | 0.86 | ATM (0.52) | ALDH1A1KMT2AHPGDKDM4E | |
| SCHEMBL21783770 | 0.86 | HPGD (0.41) | SLC29A1ALDH1A1HTR4GLACYP3A4 | |
| SCHEMBL21783771 | 0.86 | KMT2A (0.39) | HRH3SLC29A1ALDH1A1HTR4GLA | |
| SCHEMBL21705218 | 0.85 | ALDH1A1 (0.46) | HRH3SLC29A1ALDH1A1HTR4GLA | |
| SCHEMBL21705210 | 0.84 | HTR4 (0.42) | SLC29A1HTR4 | |
| SCHEMBL21705227 | 0.83 | HTR4 (0.55) | SLC29A1ALDH1A1HTR4KMT2AHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11835859-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230129578-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-11187980-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-30 | — | — | US | disclosed |
| US-20200192222-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20200073237-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-03-05 | — | — | US | disclosed |