SCHEMBL21711249

SCHEMBL21711249

O=C(Oc1c(I)cc(I)cc1I)C(=O)ON1C(=O)CCC1=O

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
▸ MGLL Q99685 2/20 0.35
▸ POLB P06746 1/20 0.34
▸ NLRP3 Q96P20 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21711245 0.81 — —
SCHEMBL21711246 0.81 — —
SCHEMBL21711252 0.80 KMT2A (0.37) MGLLPOLB
SCHEMBL21711248 0.79 HTT (0.31) —
SCHEMBL21711253 0.76 — —
SCHEMBL865136 0.75 MGLL (0.40) MGLL
SCHEMBL21711250 0.74 KMT2A (0.33) MGLLPOLB
SCHEMBL21711270 0.74 KMT2A (0.33) POLB
SCHEMBL568692 0.72 HDAC3 (0.33) —
SCHEMBL22076666 0.70 MGLL (0.33) MGLL

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200050107-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 — — US disclosed
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