Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 5/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | SENP1 | Q9P0U3 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | HPGD | P15428 | 2/20 | 0.32 |
| ▸ | MGLL | Q99685 | 1/20 | 0.31 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.31 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.30 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.30 |
| ▸ | CA12 | O43570 | 1/20 | 0.30 |
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA9 | Q16790 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL317627 | 0.82 | PTPN2 (0.44) | KMT2AALDH1A1HPGDMGLLPTPN2 | |
| SCHEMBL21711270 | 0.81 | KMT2A (0.33) | KMT2AMAPK1POLB | |
| SCHEMBL21711250 | 0.81 | KMT2A (0.33) | KMT2AMAPK1POLBMGLL | |
| SCHEMBL300884 | 0.80 | CA12 (0.42) | KMT2ALMNAMAPK1ALDH1A1HPGD | |
| SCHEMBL21711249 | 0.80 | MGLL (0.35) | POLBMGLL | |
| SCHEMBL22076666 | 0.79 | MGLL (0.33) | KMT2AMAPK1MGLLMEN1CA12 | |
| SCHEMBL21711246 | 0.76 | — | — | |
| SCHEMBL21711245 | 0.76 | — | — | |
| SCHEMBL21500876 | 0.76 | SENP1 (0.54) | KMT2ALMNAMAPK1SENP1ALDH1A1 | |
| SCHEMBL27098186 | 0.76 | ALDH1A1 (0.40) | KMT2ALMNAMAPK1POLBALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20200050107-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-02-13 | — | — | US | disclosed |