SCHEMBL21711245

SCHEMBL21711245

O=C(CC(=O)ON1C(=O)CCC1=O)Oc1c(I)cc(I)cc1I

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21711249 0.81 MGLL (0.35) —
SCHEMBL2618714 0.78 MGLL (0.34) —
SCHEMBL21711246 0.77 — —
SCHEMBL21711252 0.76 KMT2A (0.37) —
SCHEMBL21711248 0.75 HTT (0.31) —
SCHEMBL21711253 0.73 — —
SCHEMBL22861286 0.72 MTNR1A (0.33) —
SCHEMBL21711270 0.71 KMT2A (0.33) —
SCHEMBL21711250 0.71 KMT2A (0.33) —
SCHEMBL13183261 0.71 BRD4 (0.39) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200050107-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-13 — — US disclosed
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