Known targets — ChEMBL curated mechanism
BTKCACNA1CCACNA1DCACNA1FCACNA1SCACNA2D1CACNA2D2DRD2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQHRH1HTR2AP2RY12
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.59 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.59 |
| ▸ | CRBN | Q96SW2 | 4/20 | 0.48 |
| ▸ | MAPT | P10636 | 5/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 2/20 | 0.43 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.41 |
| ▸ | DDB1 | Q16531 | 2/20 | 0.41 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.40 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.40 |
| ▸ | PTPRA | P18433 | 1/20 | 0.39 |
| ▸ | PTPRB | P23467 | 1/20 | 0.39 |
| ▸ | PARL | Q9H300 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Succinimide SCHEMBL217833 | 0.92 | TSHR (0.64) | TSHRSMN1; SMN2CRBNMAPTCYP2C19 | |
| Succinimide SCHEMBL29249628 | 0.84 | TSHR (0.53) | TSHRSMN1; SMN2CRBNMAPTCYP2C19 | |
| 2-Pyrrolidone SCHEMBL29289950 | 0.82 | TSHR (0.55) | TSHRSMN1; SMN2CRBNMAPTCYP2C19 | |
| Cyclohexane SCHEMBL18585697 | 0.80 | TSHR (0.84) | TSHRSMN1; SMN2CYP2C19POLBCYP2D6 | |
| Cyclopropane SCHEMBL2101078 | 0.80 | TSHR (0.84) | TSHRSMN1; SMN2CYP2C19POLBCYP2D6 | |
| Azetidine SCHEMBL28177662 | 0.78 | TSHR (0.73) | TSHRSMN1; SMN2CYP2C19CYP3A4CYP2C9 | |
| Phosphine SCHEMBL27770571 | 0.78 | TSHR (0.80) | TSHRSMN1; SMN2CYP2C19POLBCYP2D6 | |
| Sulfuric Acid SCHEMBL6537451 | 0.77 | CRBN (0.72) | TSHRCRBNMAPTCYP2C19ALDH1A1 | |
| Sulfuric Acid SCHEMBL5145399 | 0.77 | CRBN (0.72) | TSHRCRBNMAPTCYP2C19ALDH1A1 | |
| SCHEMBL597672 | 0.77 | TSHR (1.00) | TSHRSMN1; SMN2CYP2C19POLBCYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119731179-A | IKZF2 degradation agent and application thereof | 密歇根大学董事会 | 2025-03-28 | — | — | CN | disclosed |
| EP-4499649-A1 | IKZF2 DEGRADERS AND USES THEREOF | Regents of the University of Michigan (US) | 2025-02-05 | — | — | EP | disclosed |
| WO-2024192064-A1 | COMPOUNDS AND COMPOSITIONS AS SMARCA2/4 DEGRADERS AND USES THEREOF | ONCOPIA THERAPEUTICS, INC. D/B/A/ PROTEOVANT THERAPEUTICS, INC. (US) | 2024-09-19 | — | — | WO | disclosed |
| WO-2024015340-A1 | CEREBLON LIGANDS AND USES THEREOF | REGENTS OF THE UNIVERSITY OF MICHIGAN (US) | 2024-01-18 | — | — | WO | disclosed |
| WO-2023183540-A1 | IKZF2 DEGRADERS AND USES THEREOF | REGENTS OF THE UNIVERSITY OF MICHIGAN (US) | 2023-09-28 | — | — | WO | disclosed |
| CN-104969127-B | Compound, lower layer film for lithography forming material, lower layer film for lithography and pattern forming method | 三菱瓦斯化学株式会社 | 2019-11-26 | — | — | CN | disclosed |
| CN-106094440-B | Lower layer film for lithography forming material, lower layer film for lithography and pattern forming method | 三菱瓦斯化学株式会社 | 2019-11-22 | — | — | CN | disclosed |
| CN-106062630-B | Photopolymerizable compositions for electroless plating processes | 伊斯曼柯达公司 | 2019-11-05 | — | — | CN | disclosed |
| CN-106459650-B | Latex primer composition and latex primer coated substrate | 伊斯曼柯达公司 | 2019-05-10 | — | — | CN | disclosed |
| CN-104718202-B | The method for being used to prepare (S) -3- (4- ((4- (morpholinyl methyl) benzyl) oxygroup) -1- oxoisoindolines -2- base) piperidine-2,6-diones and its pharmaceutically acceptable form | 细胞基因公司 | 2018-11-20 | — | — | CN | disclosed |
| US-20070128886-A1 | Substrate, method for producing the same, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-06-07 | — | — | US | disclosed |
| US-20070117411-A1 | Rework process for photoresist film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-24 | — | — | US | disclosed |
| EP-1788436-A1 | Rework process for photoresist film | Shin-Etsu Chemical Company, Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
| EP-1788437-A2 | Rework process for photoresist film | Shinetsu Chemical Co., Ltd. (JP) | 2007-05-23 | — | — | EP | disclosed |
| US-20070111140-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| US-20070111134-A1 | solvent remove the first photoresist film, forming a second photoresist film over the second antireflection silicone resin film which is over the first antireflection silicone resin film; lower cost and provide an excellent resist pattern | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-17 | — | — | US | disclosed |
| US-7189493-B2 | Polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-20060234158-A1 | Bottom resist layer composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-10-19 | — | — | US | disclosed |
| US-20060147836-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-07-06 | — | — | US | disclosed |
| US-20050079440-A1 | Novel polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |