Known targets — ChEMBL curated mechanism
BTKCACNA1CCACNA1DCACNA1FCACNA1SCACNA2D1CACNA2D2DRD2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQHRH1HTR2AP2RY12
The experimentally established mechanism targets of Succinimide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.64 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.64 |
| ▸ | MAPT | P10636 | 3/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.47 |
| ▸ | POLB | P06746 | 2/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.46 |
| ▸ | CRBN | Q96SW2 | 5/20 | 0.45 |
| ▸ | DDB1 | Q16531 | 3/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | MAPK13 | O15264 | 1/20 | 0.42 |
| ▸ | MAPK12 | P53778 | 1/20 | 0.42 |
| ▸ | MAPK11 | Q15759 | 1/20 | 0.42 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.42 |
| ▸ | PARL | Q9H300 | 2/20 | 0.41 |
| ▸ | PTPRA | P18433 | 1/20 | 0.41 |
| ▸ | PTPRB | P23467 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL217504 | 0.92 | TSHR (0.59) | TSHRSMN1; SMN2MAPTCYP2C19CYP3A4 | |
| Succinimide SCHEMBL29249628 | 0.91 | TSHR (0.53) | TSHRSMN1; SMN2MAPTCYP2C19CYP3A4 | |
| SCHEMBL5850190 | 0.82 | TSHR (0.94) | TSHRSMN1; SMN2CYP2C19POLBCYP2D6 | |
| Succinimide SCHEMBL8490587 | 0.81 | TSHR (0.67) | TSHRSMN1; SMN2CYP3A4CYP2C9CRBN | |
| Succinimide SCHEMBL217831 | 0.81 | MAPT (0.50) | TSHRSMN1; SMN2MAPTPOLBCYP2D6 | |
| Benzene SCHEMBL9751882 | 0.80 | TSHR (1.00) | TSHRSMN1; SMN2CYP2C19POLBCYP2D6 | |
| SCHEMBL3409457 | 0.80 | TSHR (1.00) | TSHRSMN1; SMN2CYP2C19POLBCYP2D6 | |
| SCHEMBL2509 | 0.80 | TSHR (1.00) | TSHRSMN1; SMN2CYP2C19POLBCYP2D6 | |
| SCHEMBL597672 | 0.80 | TSHR (1.00) | TSHRSMN1; SMN2CYP2C19POLBCYP2D6 | |
| SCHEMBL30671620 | 0.80 | TSHR (1.00) | TSHRSMN1; SMN2CYP2C19POLBCYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2687548-B1 | ORGANIC/INORGANIC COMPOSITE, MANUFACTURING METHOD THEREFOR, ORGANIC/INORGANIC COMPOSITE FILM, MANUFACTURING METHOD THEREFOR, PHOTONIC CRYSTAL, COATING MATERIAL, THERMOPLASTIC COMPOSITION, MICROSTRUCTURE, OPTICAL MATERIAL, ANTIREFLECTION MEMBER, AND OPTICAL LENS | ASAHI CHEMICAL IND (JP) | 2019-07-31 | — | — | EP | disclosed |
| CN-107250089-A | Compound, resin, lower layer film for lithography formation material, lower layer film for lithography form the purification process with composition, lower layer film for lithography, corrosion-resisting pattern forming method, circuit pattern forming method and compound or resin | 三菱瓦斯化学株式会社 | 2017-10-13 | — | — | CN | disclosed |
| US-20150037535-A1 | Organic/Inorganic Composite, Manufacturing Method Therefor, Organic/Inorganic Composite Film, Manufacturing Method Therefor, Photonic Crystal, Coating Material, Thermoplastic Composition, Microstructure, Optical Material, Antireflection Member, and Optical Lens | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2015-02-05 | — | — | US | disclosed |
| US-8809458-B2 | Polysiloxane composition | KANEKA CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| EP-2687548-A1 | ORGANIC/INORGANIC COMPOSITE, MANUFACTURING METHOD THEREFOR, ORGANIC/INORGANIC COMPOSITE FILM, MANUFACTURING METHOD THEREFOR, PHOTONIC CRYSTAL, COATING MATERIAL, THERMOPLASTIC COMPOSITION, MICROSTRUCTURE, OPTICAL MATERIAL, ANTIREFLECTION MEMBER, AND OPTICAL LENS | Asahi Kasei Chemicals Corporation (JP) | 2014-01-22 | — | — | EP | disclosed |
| EP-1788436-B1 | Rework process for photoresist film | SHINETSU CHEMICAL CO (JP) | 2013-01-09 | — | — | EP | disclosed |
| EP-1813985-B1 | Antireflection film composition, substrate, and pattering process | SHINETSU CHEMICAL CO (JP) | 2012-10-31 | — | — | EP | disclosed |
| US-8288072-B2 | Antireflection film; fast etching speed whcih reduces deformation; accuracy; 2,3-epoxypropyl methacrylate ester-styrene copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-8088554-B2 | Bottom resist layer composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2012-01-03 | — | — | US | disclosed |
| US-7868407-B2 | Substrate comprising a lower silicone resin film and an upper silicone resin film | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-01-11 | — | — | US | disclosed |
| US-7189493-B2 | Polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| EP-1720063-A1 | Resin containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-20060234158-A1 | Bottom resist layer composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-10-19 | — | — | US | disclosed |
| US-7105272-B2 | Acid-degradable resin compositions containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| US-20060147836-A1 | Resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-07-06 | — | — | US | disclosed |
| US-7029827-B2 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-04-18 | — | — | US | disclosed |
| US-20050130057-A1 | Acid-degradable resin compositions containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2005-06-16 | — | — | US | disclosed |
| US-20050079440-A1 | Novel polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-04-14 | — | — | US | disclosed |
| EP-1482361-A1 | ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER | NIPPON SODA CO., LTD. (JP) | 2004-12-01 | — | — | EP | disclosed |
| US-6156476-A | Positive photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-12-05 | — | — | US | disclosed |