SCHEMBL23587441

SCHEMBL23587441

CC(C)(C)OC(=O)Oc1ccc2ccc3c(c2c1)C(c1cc(I)c(O)c(I)c1)c1c(ccc2ccc(O)cc12)O3

nearest known ligand 0.37

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 2/20 0.37
ELANE P08246 1/20 0.35
KDM1A O60341 1/20 0.35
CA2 P00918 1/20 0.35
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
ALDH1A1 P00352 2/20 0.35
FGB P02675 1/20 0.35
HPGD P15428 1/20 0.35
TNNI3 P19429 1/20 0.35
TNNT2 P45379 1/20 0.35
RECQL P46063 1/20 0.35
TNNC1 P63316 1/20 0.35
LMNA P02545 1/20 0.34
NQO2 P16083 1/20 0.33
ESR1 P03372 2/20 0.31
ESR2 Q92731 2/20 0.31
TTR P02766 1/20 0.31
MTNR1A P48039 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23587443 0.90 NPSR1 (0.37) NPSR1ELANEKDM1ACA2MEN1
SCHEMBL18615296 0.90 MEN1 (0.37) NPSR1ELANEKDM1ACA2MEN1
SCHEMBL23960175 0.89 NPSR1 (0.38) NPSR1ELANEKDM1ACA2MEN1
SCHEMBL23587442 0.89 CA2 (0.33) NPSR1ELANEKDM1ACA2MEN1
SCHEMBL23587420 0.86 NPSR1 (0.37) NPSR1MEN1KMT2AALDH1A1FGB
SCHEMBL18613100 0.84 MEN1 (0.36) NPSR1ELANEKDM1ACA2MEN1
SCHEMBL21755771 0.83 NPSR1 (0.37) NPSR1ELANEKDM1ACA2
SCHEMBL21755801 0.83 MEN1 (0.45) NPSR1MEN1KMT2AALDH1A1FGB
SCHEMBL18615248 0.82 NPSR1 (0.42) NPSR1ELANEKDM1ACA2MEN1
SCHEMBL18615297 0.81 MEN1 (0.39) NPSR1ELANEKDM1ACA2MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210331994-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-10-28 US disclosed
EP-3842491-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-06-30 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210331994-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM BMI1, PRDM9, CTCF NPSR1 3828/4885ELANE 3153/4885KDM1A 63/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.