Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.45 |
| ▸ | MAPT | P10636 | 2/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.45 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.45 |
| ▸ | G6PD | P11413 | 1/20 | 0.45 |
| ▸ | PKM | P14618 | 1/20 | 0.45 |
| ▸ | HPGD | P15428 | 1/20 | 0.45 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.45 |
| ▸ | CCR6 | P51684 | 1/20 | 0.45 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.45 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.45 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.42 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13416158 | 0.98 | CYP1A2 (0.43) | CYP1A2CYP3A4CYP2D6MAPTCYP2C9 | |
| SCHEMBL12005179 | 0.95 | CYP3A4 (0.41) | CYP1A2CYP3A4CYP2D6MAPTCYP2C9 | |
| SCHEMBL278561 | 0.94 | CYP2D6 (0.50) | CYP1A2CYP3A4CYP2D6MAPTCYP2C9 | |
| SCHEMBL4055460 | 0.90 | ESR1 (0.41) | CYP1A2CYP3A4CYP2D6MAPTCYP2C9 | |
| SCHEMBL25998110 | 0.90 | LMNA (0.45) | CYP1A2CYP3A4CYP2D6MAPTCYP2C9 | |
| SCHEMBL18888468 | 0.90 | TP53 (0.40) | CYP1A2CYP3A4CYP2D6MAPTCYP2C9 | |
| SCHEMBL278739 | 0.90 | TYR (0.44) | CYP1A2CYP3A4CYP2D6MAPTCYP2C9 | |
| SCHEMBL23919975 | 0.89 | PTGS1 (0.42) | CYP1A2CYP3A4CYP2D6MAPTCYP2C9 | |
| SCHEMBL12415075 | 0.89 | KDM4E (0.45) | CYP1A2CYP3A4CYP2D6MAPTCYP2C9 | |
| SCHEMBL21775831 | 0.89 | ALDH1A1 (0.45) | CYP1A2CYP3A4CYP2D6MAPTCYP2C9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 388 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-8193054-A | — | — | None | — | — | JP | disclosed |
| US-20260050215-A1 | MATERIAL FOR FORMING SUPERFINE PATTERN, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN TREATMENT COMPOSITION AND FORMATION METHOD OF SUPERFINE PATTERN | Advanced Echem Materials Company Limited (TW) | 2026-02-19 | — | — | US | disclosed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-119575759-A | Positive photosensitive resin composition, photosensitive film, resist underlayer film, resist permanent film, and method for producing film | DIC株式会社 | 2025-03-07 | — | — | CN | disclosed |
| CN-119361563-A | Laminate and method for manufacturing electronic component | 东京应化工业株式会社 | 2025-01-24 | — | — | CN | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| CN-118672058-A | Photosensitive resin composition, resist film, resist underlayer film, and resist permanent film | DIC株式会社 | 2024-09-20 | — | — | CN | disclosed |
| CN-116209690-B | Phenolic hydroxyl group-containing resin, resin composition for alkali-developable resist, resist-curable resin composition, and method for producing phenolic hydroxyl group-containing resin | DIC株式会社 | 2024-09-06 | — | — | CN | disclosed |
| US-20240270891-A1 | PHENOLIC HYDROXY GROUP-CONTAINING RESIN, RESIN COMPOSITION FOR ALKALINE DEVELOPABLE RESIST, RESIST CURABLE RESIN COMPOSITION, AND METHOD FOR PRODUCING PHENOLIC HYDROXY GROUP-CONTAINING RESIN | DIC CORPORATION (JP) | 2024-08-15 | — | — | US | disclosed |
| CN-118325004-A | Phenolic hydroxyl group-containing resin, photosensitive resin composition, curable composition, and resist film | DIC株式会社 | 2024-07-12 | — | — | CN | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| JP-H08193054-A | BIS(4-T-BUTOXYCARBONYLMETHYLOXY-2,5-DIMETHYLPHENYL) METHYL-4-T-BUTOXYCARBONYLMETHYLOXYBENZENE AND ITS DERIVATIVE | SHIN ETSU CHEM CO LTD | 1996-07-30 | — | — | JP | disclosed |
| US-5501936-A | IMPROVED RESOLUTION OF VERY FINE PATTERNS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1996-03-26 | — | — | US | disclosed |
| US-5478692-A | Fine patterning for electronics | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-12-26 | — | — | US | disclosed |
| EP-0668540-A1 | Positive working recording material with improved development properties | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-08-23 | — | — | EP | disclosed |
| US-5434031-A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | TOKYO OHKA KOGYO CO., LTD. (JP) | 1995-07-18 | — | — | US | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
| US-5413896-A | Light sensitive element with novolak resin and quinonediazide compounds | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-05-09 | — | — | US | disclosed |
| EP-0633499-A1 | Radiation sensitive resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-01-11 | — | — | EP | disclosed |
| US-5332647-A | Photosensitive resins for elements | TOKYO OHKA KOGYO CO., LTD. (JP) | 1994-07-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260050215-A1 | MATERIAL FOR FORMING SUPERFINE PATTERN, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN TREATMENT COMPOSITION AND FORMATION METHOD OF SUPERFINE PATTERN | SEM1, ASH2L, RAD51 | CYP1A2 1955/4885CYP3A4 2840/4885CYP2D6 2417/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.