SCHEMBL21775907

SCHEMBL21775907

Cc1cc(C(c2cc(C)c(OCC(=O)OC(C)(C)C)c(C)c2)c2cc(I)cc(I)c2O)cc(C)c1OCC(=O)OC(C)(C)C

nearest known ligand 0.34

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 2/20 0.34
ALDH1A1 P00352 2/20 0.34
HPGD P15428 2/20 0.34
HSD17B10 Q99714 2/20 0.34
POLB P06746 1/20 0.34
TTR P02766 1/20 0.31
CNR1 P21554 1/20 0.31
MTNR1A P48039 1/20 0.31
MTNR1B P49286 1/20 0.31
GABRA1 P14867 1/20 0.31
GABRB1 P18505 1/20 0.31
GABRB2 P47870 1/20 0.31
ACLY P53396 1/20 0.30
PTPN1 P18031 1/20 0.30
MEN1 O00255 1/20 0.30
TSHR P16473 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21775908 0.83 TTR (0.33) TTR
SCHEMBL23627426 0.81 CNR1 (0.38) KDM4EALDH1A1HPGDHSD17B10POLB
SCHEMBL21241782 0.80 CNR1 (0.41) KDM4EALDH1A1HPGDHSD17B10POLB
SCHEMBL21775756 0.80 LMNA (0.33) KDM4EALDH1A1HPGDHSD17B10POLB
SCHEMBL17629032 0.76 MTNR1A (0.40) KDM4EALDH1A1HPGDHSD17B10POLB
SCHEMBL21775757 0.75 CNR1 (0.42) KDM4EALDH1A1HPGDHSD17B10POLB
SCHEMBL3683299 0.73 ALDH1A1 (0.41) KDM4EALDH1A1HPGDHSD17B10POLB
SCHEMBL21241704 0.73 TTR (0.50) HSD17B10TTRGABRA1GABRB1GABRB2
SCHEMBL24908732 0.72 KDM4E (0.47) KDM4EALDH1A1HPGDHSD17B10POLB
SCHEMBL21775906 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210206901-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-07-08 US disclosed
WO-2020040161-A1 COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM 三菱瓦斯化学株式会社 2020-02-27 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210206901-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM BMI1, PRDM9, CTCF KDM4E 584/4885ALDH1A1 2087/4885HPGD 2579/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.