⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21775908 | 0.82 | TTR (0.33) | — | |
| SCHEMBL27255623 | 0.75 | ELANE (0.39) | — | |
| SCHEMBL23627363 | 0.74 | ELANE (0.37) | — | |
| SCHEMBL27280348 | 0.72 | ELANE (0.43) | — | |
| SCHEMBL8015384 | 0.71 | ELANE (0.41) | — | |
| SCHEMBL23627362 | 0.71 | ELANE (0.31) | — | |
| SCHEMBL21775907 | 0.71 | KDM4E (0.34) | — | |
| SCHEMBL23627432 | 0.70 | ELANE (0.34) | — | |
| SCHEMBL21774692 | 0.68 | ELANE (0.39) | — | |
| SCHEMBL16837504 | 0.67 | L3MBTL1 (0.44) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210206901-A1 | COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN AND METHOD FOR FORMING INSULATING FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-07-08 | — | — | US | disclosed |
| WO-2020040161-A1 | COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM | 三菱瓦斯化学株式会社 | 2020-02-27 | — | — | WO | disclosed |