Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | NR1H3 | Q13133 | 3/20 | 0.34 |
| ▸ | NR1H2 | P55055 | 2/20 | 0.34 |
| ▸ | PGR | P06401 | 4/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.32 |
| ▸ | MLYCD | O95822 | 4/20 | 0.31 |
| ▸ | AR | P10275 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18030078 | 0.85 | LMNA (0.35) | LMNANR1H3NR1H2SMN1; SMN2GAA | |
| SCHEMBL21776385 | 0.80 | LMNA (0.43) | LMNANR1H3NR1H2SMN1; SMN2GAA | |
| SCHEMBL26078923 | 0.79 | LMNA (0.39) | LMNANR1H3NR1H2PGRSMN1; SMN2 | |
| SCHEMBL21776384 | 0.78 | NR1H3 (0.39) | LMNANR1H3NR1H2MLYCD | |
| SCHEMBL21776170 | 0.73 | NPSR1 (0.33) | LMNANR1H3NR1H2MAPK1NPSR1 | |
| SCHEMBL21776169 | 0.72 | KCNJ11 (0.38) | GAANPSR1 | |
| SCHEMBL14477140 | 0.70 | ESR1 (0.36) | MAPK1 | |
| SCHEMBL21943829 | 0.70 | ELANE (0.33) | — | |
| SCHEMBL18610621 | 0.69 | MLYCD (0.36) | LMNANR1H3NR1H2SMN1; SMN2GAA | |
| SCHEMBL11314670 | 0.68 | CD69 (0.45) | NR1H3NR1H2PGRSMN1; SMN2MLYCD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11681224-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-20 | — | — | US | disclosed |
| US-20200064735-A1 | RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-02-27 | — | — | US | disclosed |