SCHEMBL21783833

SCHEMBL21783833

OC(OCCOCCOCCN1CCOCC1)c1cc(I)cc(I)c1I

nearest known ligand 0.41

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.41
TSHR P16473 1/20 0.41
ALDH1A1 P00352 4/20 0.40
SMN1; SMN2 Q16637 1/20 0.37
POLB P06746 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
HTT P42858 1/20 0.34
CHRM2 P08172 1/20 0.33
CHRM1 P11229 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22097576 0.77 HPGD (0.32)
SCHEMBL21705252 0.74 ALDH1A1 (0.46) KDM4ETSHRALDH1A1SMN1; SMN2POLB
SCHEMBL21705249 0.74 ALDH1A1 (0.46) KDM4ETSHRALDH1A1SMN1; SMN2POLB
SCHEMBL13066033 0.69 TSHR (0.49) KDM4ETSHRALDH1A1SMN1; SMN2POLB
SCHEMBL26938985 0.69 TSHR (0.49) KDM4ETSHRALDH1A1SMN1; SMN2POLB
SCHEMBL23208314 0.68 ATM (0.40) KDM4EALDH1A1SMN1; SMN2L3MBTL1MEN1
SCHEMBL21705199 0.68 ATM (0.52) KDM4EALDH1A1SMN1; SMN2L3MBTL1KMT2A
SCHEMBL7106263 0.68 TSHR (0.61) KDM4ETSHRALDH1A1SMN1; SMN2POLB
SCHEMBL22097572 0.67 HPGD (0.33)
SCHEMBL21705899 0.67 GAA (0.54) KDM4EALDH1A1SMN1; SMN2POLBL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11187980-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-11-30 US disclosed
US-20200073237-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed