SCHEMBL22097572

SCHEMBL22097572

O=S1(=O)CCN(CCO[C@H](O)c2cc(I)cc(I)c2O)CC1

nearest known ligand 0.33

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
HPGD P15428 3/20 0.33
ESR1 P03372 1/20 0.32
ESR2 Q92731 1/20 0.32
TTR P02766 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22097576 0.89 HPGD (0.32) HPGDESR1ESR2
SCHEMBL22097582 0.79 SLC6A4 (0.38)
SCHEMBL21705616 0.76 HRH3 (0.39) HPGDESR1
SCHEMBL21783809 0.74 SLC6A4 (0.39)
SCHEMBL26426639 0.71 KDM4E (0.41) HPGDESR1
SCHEMBL21783773 0.69 HRH3 (0.39) HPGD
SCHEMBL21783833 0.67 KDM4E (0.41)
SCHEMBL26426637 0.65 HRH3 (0.41) HPGD
SCHEMBL9911419 0.64 KDM1A (0.36) HPGD
SCHEMBL26426650 0.64 SLC29A1 (0.40)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 US disclosed