SCHEMBL21786247

SCHEMBL21786247

CC(=O)Oc1ccc(OCC(=O)OC(CS(=O)(=O)O)(C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.40
POLB P06746 1/20 0.40
PKM P14618 1/20 0.40
PSEN1 P49768 2/20 0.39
PSEN2 P49810 2/20 0.39
APH1B Q8WW43 2/20 0.39
NCSTN Q92542 2/20 0.39
APH1A Q96BI3 2/20 0.39
PSENEN Q9NZ42 2/20 0.39
GAA P10253 3/20 0.38
LMNA P02545 3/20 0.38
NPSR1 Q6W5P4 1/20 0.37
L3MBTL1 Q9Y468 2/20 0.34
KDM4E B2RXH2 2/20 0.34
MEN1 O00255 1/20 0.34
TTR P02766 1/20 0.34
TP53 P04637 1/20 0.34
CYP3A4 P08684 1/20 0.34
KMT2A Q03164 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18470631 0.88 ELANE (0.38) MAPTPOLBPSEN1PSEN2APH1B
SCHEMBL19846661 0.85 THRB (0.37) MAPTPSEN1PSEN2APH1BNCSTN
SCHEMBL20403882 0.84 ALOX15 (0.44) MAPTPSEN1PSEN2APH1BNCSTN
SCHEMBL24292293 0.81 SMN1; SMN2 (0.37) PSEN1PSEN2APH1BNCSTNAPH1A
SCHEMBL24453074 0.79 PSEN1 (0.35) MAPTPOLBPKMPSEN1PSEN2
SCHEMBL18470634 0.78 PSEN1 (0.34) MAPTPSEN1PSEN2APH1BNCSTN
SCHEMBL18470636 0.78 GRM2 (0.36) MAPTPSEN1PSEN2APH1BNCSTN
SCHEMBL21786246 0.75 CYP1A1 (0.38) MAPTPOLBPKMGAALMNA
SCHEMBL21786209 0.73 MAPT (0.41) MAPTLMNAMEN1TP53CYP3A4
SCHEMBL13829112 0.73 GAA (0.33) GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11124477-B2 Sulfonium compound, positive resist composition, and resist pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-09-21 US disclosed
US-20200071268-A1 SULFONIUM COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-03-05 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11124477-B2 Sulfonium compound, positive resist composition, and resist pattern forming process H1-4, H1-0, SLC11A2 MAPT 4095/4885POLB 601/4885PKM 3253/4885
US-20200071268-A1 SULFONIUM COMPOUND, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS H1-4, H1-0, SLC11A2 MAPT 4095/4885POLB 601/4885PKM 3253/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.