⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22229073 | 0.81 | — | — | |
| SCHEMBL22229074 | 0.81 | — | — | |
| SCHEMBL1476763 | 0.79 | — | — | |
| SCHEMBL128361 | 0.77 | — | — | |
| SCHEMBL10070949 | 0.74 | — | — | |
| SCHEMBL1476610 | 0.74 | — | — | |
| SCHEMBL24511860 | 0.72 | — | — | |
| SCHEMBL21805858 | 0.72 | — | — | |
| SCHEMBL1476790 | 0.72 | THRB (0.31) | — | |
| SCHEMBL16626031 | 0.70 | ALDH1A1 (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11644752-B2 | Polymer, positive resist composition, and method of forming resist pattern | ZEON CORPORATION (JP) | 2023-05-09 | — | — | US | disclosed |
| US-11644752-B2 | Polymer, positive resist composition, and method of forming resist pattern | ZEON CORPORATION (JP) | 2023-05-09 | — | — | US | disclosed |
| US-20200073240-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2020-03-05 | — | — | US | disclosed |