⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1476790 | 0.85 | THRB (0.31) | — | |
| SCHEMBL16626031 | 0.83 | ALDH1A1 (0.32) | — | |
| SCHEMBL1477027 | 0.83 | ALDH1A1 (0.37) | — | |
| SCHEMBL1476332 | 0.83 | ALDH1A1 (0.32) | — | |
| SCHEMBL10070949 | 0.81 | — | — | |
| SCHEMBL1476610 | 0.81 | — | — | |
| SCHEMBL21790384 | 0.79 | — | — | |
| SCHEMBL2553073 | 0.78 | — | — | |
| SCHEMBL8056794 | 0.77 | — | — | |
| SCHEMBL22229074 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7067601-B2 | Multi-functional alpha-alkoxyalkyl acrylate and methacrylate ester compositions and reworkable polymers formed therefrom | HENKEL CORPORATION (US) | 2006-06-27 | — | — | US | claimed |
| US-6921454-B2 | Elastomer toughened radiation curable adhesives | HENKEL CORPORATION (US) | 2005-07-26 | — | — | US | claimed |
| US-6916890-B1 | Thermally reworkable epoxy resins and compositions based thereon | HENKEL CORPORATION (US) | 2005-07-12 | — | — | US | claimed |
| US-20050101689-A1 | Multi-functional alpha-alkoxyalkyl acrylate and methacrylate ester compositions and reworkable polymers formed therefrom | Henkel IP & Holding GmbH (DE) | 2005-05-12 | — | — | US | claimed |
| WO-2003046096-A1 | ELASTOMER TOUGHENED RADIATION CURABLE ADHESIVES | HENKEL CORPORATION (US) | 2003-06-05 | — | — | WO | claimed |
| US-20030100624-A1 | Elastomer toughened radiation curable adhesives | LOCTITE CORPORATION | 2003-05-29 | — | — | US | claimed |
| WO-2003031492-A1 | THERMALLY REWORKABLE EPOXY RESINS AND COMPOSITIONS BASED THEREO N | HENKEL CORPORATION (US) | 2003-04-17 | — | — | WO | claimed |
| WO-2002046291-A1 | MULTI-FUNCTIONAL ALPHA-ALKOXYALKYL ACRYLATE AND METHACRYLATE ESTER COMPOSITIONS AND REWORKABLE POLYMERS FORMED THEREFROM | HENKEL LOCTITE CORPORATION (US) | 2002-06-13 | — | — | WO | claimed |
| CN-114449990-A | UV resistant cosmetic composition | 可泰克斯公司 | 2022-05-06 | — | — | CN | disclosed |
| WO-2021070491-A1 | PHOTOCURABLE COMPOSITION FOR NANOIMPRINTING | サンアプロ株式会社 | 2021-04-15 | — | — | WO | disclosed |
| EP-2813892-B1 | Photoresist underlayer film-forming composition and pattern forming processes | SHINETSU CHEMICAL CO (JP) | 2020-06-17 | — | — | EP | disclosed |
| US-10228621-B2 | Underlayer film-forming composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-12 | — | — | US | disclosed |
| US-10156788-B2 | Resist underlayer film composition, patterning process, and compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-12-18 | — | — | US | disclosed |
| EP-2813890-B1 | Photoresist underlayer film-forming composition and pattern forming processes | SHINETSU CHEMICAL CO (JP) | 2018-05-30 | — | — | EP | disclosed |
| WO-2003031492-A1 | THERMALLY REWORKABLE EPOXY RESINS AND COMPOSITIONS BASED THEREO N | HENKEL CORPORATION (US) | 2003-04-17 | — | — | WO | disclosed |
| US-6417243-B1 | POLYESTERURETHANE BLOCKS | UCB, S.A. (BE) | 2002-07-09 | — | — | US | disclosed |
| WO-2002046291-A1 | MULTI-FUNCTIONAL ALPHA-ALKOXYALKYL ACRYLATE AND METHACRYLATE ESTER COMPOSITIONS AND REWORKABLE POLYMERS FORMED THEREFROM | HENKEL LOCTITE CORPORATION (US) | 2002-06-13 | — | — | WO | disclosed |
| US-6210790-B1 | TRANSPARENCY, HARDNESS, ABRASION-RESISTANCE | RENSSELAER POLYTECHNIC INSTITUTE | 2001-04-03 | — | — | US | disclosed |
| US-5567858-A | COATINGS, SEAL, VARNISHES, ADHESIVES | RENSSELAER POLYTECHNIC INSTITUTE (US) | 1996-10-22 | — | — | US | disclosed |
| US-5486545-A | SOLVENT RESISTANCE | RENSSELAER POLYTECHNIC INSTITUTE (US) | 1996-01-23 | — | — | US | disclosed |