SCHEMBL218341

SCHEMBL218341

Oc1ccc(Cc2cc(Cc3ccc(O)cc3)c(O)c(Cc3ccc(O)cc3)c2O)cc1

nearest known ligand 0.54

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 2/20 0.54
ESR2 Q92731 2/20 0.54
KEAP1 Q14145 1/20 0.50
MEN1 O00255 1/20 0.44
MAPT P10636 1/20 0.44
KMT2A Q03164 1/20 0.44
ALOX5 P09917 1/20 0.42
LTA4H P09960 1/20 0.40
ABAT P80404 1/20 0.39
THRA P10827 1/20 0.39
THRB P10828 1/20 0.39
BCL2 P10415 1/20 0.39
BCL2L1 Q07817 1/20 0.39
SLC28A3 Q9HAS3 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19038964 0.88 ESR1 (0.50) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL13609112 0.86 ESR1 (0.59) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL14998893 0.86 CALM1 (0.53) ESR1ESR2LTA4H
SCHEMBL14864969 0.86 ESR1 (0.48) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL30375403 0.84 ESR1 (0.56) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL1456505 0.84 ESR1 (0.56) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL19039010 0.84 ESR1 (0.46) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL19039023 0.84 ESR1 (0.42) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL19039043 0.84 ESR1 (0.42) ESR1ESR2KEAP1MEN1MAPT
SCHEMBL19038989 0.84 ESR1 (0.42) ESR1ESR2KEAP1MEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1623274-A2 PHOTORESIST COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2006-02-08 EP claimed
WO-2004088423-A2 PHOTORESIST COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (US) 2004-10-14 WO claimed
US-20040197704-A1 Photoresist compositions AZ ELECTRONIC MATERIALS USA CORP. 2004-10-07 US claimed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 US claimed
US-12497558-B2 Colour change composition and compounds THERMOGRAPHIC MEASUREMENTS LTD (GB) 2025-12-16 US disclosed
US-12297357-B2 Temperature-sensitive indicator THERMOGRAPHIC MEASUREMENTS LTD (GB) 2025-05-13 US disclosed
EP-3344468-B1 COMPOUND FOR USE IN COLOUR CHANGE COMPOSITIONS THERMOGRAPHIC MEASUREMENTS LTD (GB) 2025-03-05 EP disclosed
US-12202981-B2 Compound for use in colour change compositions SOCIETE BIC (FR) 2025-01-21 US disclosed
US-20240384116-A1 MODIFIED EPOXY RESIN AND ELECTRODEPOSITION COATING MATERIAL KANSAI PAINT CO., LTD. (JP) 2024-11-21 US disclosed
CN-115362193-B Epoxy resin and electrodeposition paint 关西涂料株式会社 2024-11-08 CN disclosed
EP-3349990-B1 COMPOUND FOR USE IN COLOUR CHANGE COMPOSITIONS SOCIéTé BIC (FR) 2024-10-30 EP disclosed
CN-118715262-A Curable resin composition 太阳控股株式会社 2024-09-27 CN disclosed
US-6790582-B1 NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT CLARIANT FINANCE BVI LIMITED (VG) 2004-09-14 US disclosed
US-6750313-B2 HIGH REFRACTIVE INDEX AND LOW DISPERSION CHARACTERISTICS; OPTICAL LENSES, FILMS, DISCS; POLYCARBONATE RESIN CONTAINING A PHOSPHONIC ACID GROUP TORAY INDUSTRIES, INC. (JP) 2004-06-15 US disclosed
US-6558867-B2 Blend of novolak resin, quinonediazidosulfonate compound andphenolic compound SHIN ETSU CHEMICAL CO., LTD. (JP) 2003-05-06 US disclosed
US-20030013836-A1 Resin composition and articles molded therefrom TORAY INDUSTRIES, INC., A CORPORATION OF JAPAN (JP) 2003-01-16 US disclosed
EP-1270646-A1 RESIN COMPOSITION AND ARTICLES MOLDED THEREFROM TORAY INDUSTRIES, INC. (JP) 2003-01-02 EP disclosed
EP-1146394-A1 PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION CLARIANT INTERNATIONAL LTD. (CH) 2001-10-17 EP disclosed
US-20010019808-A1 Lift-off resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-09-06 US disclosed
EP-0943640-A1 HIGHLY HEAT-RESISTANT, HIGH-PURITY POLYARYLATE AND FILM PRODUCED FROM THE SAME UNITIKA LTD. (JP) 1999-09-22 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12297357-B2 Temperature-sensitive indicator NCS1, TREH, NEFM ESR1 236/4885ESR2 1581/4885KEAP1 2900/4885
US-12202981-B2 Compound for use in colour change compositions TYR, C1R, CBR3 ESR1 413/4885ESR2 837/4885KEAP1 1965/4885
US-12497558-B2 Colour change composition and compounds C5, C9, C3AR1 ESR1 20/4885ESR2 77/4885KEAP1 923/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.