SCHEMBL2187405

SCHEMBL2187405

CC(C)(C)[Si](C)(C)c1ccccc1S(=O)(=O)O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MYC P01106 1/20 0.41
SMN1; SMN2 Q16637 2/20 0.35
TSHR P16473 1/20 0.35
TTR P02766 2/20 0.35
FABP4 P15090 1/20 0.33
CCNA2 P20248 1/20 0.33
CDK2 P24941 1/20 0.33
MAPK14 Q16539 1/20 0.33
TDP1 Q9NUW8 2/20 0.32
RCE1 Q9Y256 1/20 0.32
ALDH1A1 P00352 1/20 0.32
LMNA P02545 1/20 0.32
MAPT P10636 1/20 0.32
KMT2A Q03164 1/20 0.32
NR4A1 P22736 1/20 0.32
CYP1A2 P05177 2/20 0.31
POLB P06746 2/20 0.31
KDM4E B2RXH2 1/20 0.31
APEX1 P27695 1/20 0.31
COMT P21964 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2185772 0.82 MYC (0.44) MYCSMN1; SMN2TSHRTTRFABP4
SCHEMBL1061829 0.81 CA2 (0.45) CDK2
SCHEMBL30901892 0.81 CA2 (0.45) CDK2
SCHEMBL2057274 0.77 GAA (0.37) MYCTDP1ALDH1A1LMNAMAPT
SCHEMBL4436537 0.76 MYC (0.40) MYCSMN1; SMN2TSHRTTRFABP4
SCHEMBL2778003 0.75 MYC (0.41) MYCSMN1; SMN2TSHRTTRFABP4
SCHEMBL8660809 0.75 CA1 (0.39) SMN1; SMN2TSHRTDP1ALDH1A1LMNA
SCHEMBL8664478 0.73 MYC (0.41) MYCSMN1; SMN2TSHRTTRFABP4
SCHEMBL18796166 0.71 ALDH1A1 (0.43) SMN1; SMN2TSHRTDP1ALDH1A1LMNA
SCHEMBL29664068 0.71 TSHR (0.55) MYCSMN1; SMN2TSHRTTRFABP4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2031031-B1 Use of a latent acid for improving adhesion SIKA TECHNOLOGY AG (CH) 2011-07-13 EP claimed
EP-2031031-A1 Use of a latent acid for improving adhesion Sika Technology AG (CH) 2009-03-04 EP claimed
EP-2031031-B1 Use of a latent acid for improving adhesion SIKA TECHNOLOGY AG (CH) 2011-07-13 EP disclosed
EP-2031031-A1 Use of a latent acid for improving adhesion Sika Technology AG (CH) 2009-03-04 EP disclosed
EP-2031031-A1 Use of a latent acid for improving adhesion Sika Technology AG (CH) 2009-03-04 EP disclosed
US-5847218-A Sulfonium salts and chemically amplified positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-12-08 US disclosed