Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 3/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.31 |
| ▸ | TSHR | P16473 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17159507 | 0.88 | ALDH1A1 (0.33) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL4082782 | 0.81 | NPSR1 (0.33) | NPSR1 | |
| SCHEMBL482478 | 0.80 | ALDH1A1 (0.37) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL386960 | 0.80 | NPSR1 (0.38) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL2084363 | 0.79 | EPHX2 (0.43) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL15532220 | 0.78 | GRIN2D (0.39) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL12687856 | 0.78 | MEN1 (0.44) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL15533591 | 0.78 | EPHX2 (0.45) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL21997787 | 0.78 | MEN1 (0.44) | ALDH1A1NPSR1MEN1HTTKMT2A | |
| SCHEMBL15532601 | 0.78 | GRIN2D (0.39) | ALDH1A1NPSR1MEN1HTTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | disclosed |
| CN-103869623-B | Coating composition | 默克专利有限公司 | 2017-07-21 | — | — | CN | disclosed |
| US-9146467-B2 | Coating compositions | MERCK PATENT GMBH (DE) | 2015-09-29 | — | — | US | disclosed |
| US-8632948-B2 | Positive-working photoimageable bottom antireflective coating | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-01-21 | — | — | US | disclosed |
| US-20130236833-A1 | COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-09-12 | — | — | US | disclosed |
| US-8455176-B2 | Coating composition | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-06-04 | — | — | US | disclosed |
| EP-2483745-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ Electronic Materials USA Corp. (US) | 2012-08-08 | — | — | EP | disclosed |
| US-8088548-B2 | Bottom antireflective coating compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2012-01-03 | — | — | US | disclosed |
| EP-2384457-A2 | COATING COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2011-11-09 | — | — | EP | disclosed |
| CN-102209937-A | Coating composition | AZ ELECTRONIC MATERIALS USA | 2011-10-05 | — | — | CN | disclosed |
| US-20050031984-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2005-02-10 | — | — | US | disclosed |
| US-6844131-B2 | Positive-working photoimageable bottom antireflective coating | CLARIANT FINANCE (BVI) LIMITED (VG) | 2005-01-18 | — | — | US | disclosed |
| WO-2004102272-A2 | PHOTORESIST COMPOSITION FOR DEEP UV AND IMAGING PROCESS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-11-25 | — | — | WO | disclosed |
| EP-1465877-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | Clariant International Ltd. (CH) | 2004-10-13 | — | — | EP | disclosed |
| US-20040053171-A1 | Chemical amplification type resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-03-18 | — | — | US | disclosed |
| WO-2003057678-A1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | CLARIANT INTERNATIONAL LTD (CH) | 2003-07-17 | — | — | WO | disclosed |
| US-20030129531-A1 | Positive-working photoimageable bottom antireflective coating | MERCK PATENT GMBH (DE) | 2003-07-10 | — | — | US | disclosed |
| US-20020031718-A1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2002-03-14 | — | — | US | disclosed |
| US-5985522-A | PATTERN PHOTORESISTS, EXPOSURE TO LIGHT, DEVELOPMENT OF METHACRYLATE POLYMERS | NEC CORPORATION (JP) | 1999-11-16 | — | — | US | disclosed |
| US-5770346-A | BRIDGED CYCLIC HYDROCARBON GROUP-CONTAINING ACRYLATE POLYMER | NEC CORPORATION (JP) | 1998-06-23 | — | — | US | disclosed |