Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.54 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.54 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.54 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.54 |
| ▸ | HPGD | P15428 | 2/20 | 0.54 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.54 |
| ▸ | MEN1 | O00255 | 1/20 | 0.54 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.54 |
| ▸ | CES1 | P23141 | 1/20 | 0.54 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.54 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.54 |
| ▸ | LMNA | P02545 | 1/20 | 0.54 |
| ▸ | RECQL | P46063 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | GSK3B | P49841 | 2/20 | 0.50 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.50 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.50 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.50 |
| ▸ | HSD11B1 | P28845 | 7/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1516246 | 0.91 | MAPK1 (0.58) | MAPTTDP1MAPK1CYP3A4HPGD | |
| SCHEMBL28406269 | 0.88 | CA2 (0.49) | MAPTTDP1MAPK1CYP3A4HPGD | |
| SCHEMBL8761020 | 0.85 | RECQL (0.56) | MAPTTDP1MAPK1CYP3A4HPGD | |
| SCHEMBL28420629 | 0.83 | GSK3B (0.57) | MAPTTDP1MAPK1CYP3A4HPGD | |
| SCHEMBL14079438 | 0.82 | HSD11B1 (0.49) | MAPTTDP1MAPK1CYP3A4HPGD | |
| SCHEMBL824467 | 0.82 | ALDH1A1 (0.51) | MAPTTDP1MAPK1CYP3A4HPGD | |
| SCHEMBL137832 | 0.80 | MAPK1 (0.56) | MAPTTDP1MAPK1CYP3A4HPGD | |
| SCHEMBL27722919 | 0.79 | RECQL (0.46) | MAPTTDP1MAPK1CYP3A4HPGD | |
| SCHEMBL260911 | 0.78 | ALDH1A1 (0.56) | MAPTTDP1MAPK1CYP3A4HPGD | |
| SCHEMBL15791249 | 0.78 | MAPK1 (0.54) | MAPTTDP1MAPK1CYP3A4HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119836453-A | Polymer, composition, cured product, and display element | JSR株式会社 | 2025-04-15 | — | — | CN | disclosed |
| CN-118749078-A | Photosensitive resin composition set, optical waveguide, method for producing optical waveguide, opto-electric hybrid board, sheet set, core resin composition, coating resin composition, and resin sheet | 味之素株式会社 | 2024-10-08 | — | — | CN | disclosed |
| WO-2024053722-A1 | POLYMER, COMPOSITION, CURED PRODUCT, AND DISPLAY ELEMENT | JSR株式会社 | 2024-03-14 | — | — | WO | disclosed |
| WO-2023145537-A1 | PHOTOSENSITIVE RESIN COMPOSITION SET, OPTICAL WAVEGUIDE AND METHOD FOR PRODUCING SAME, PHOTOELECTRIC HYBRID BOARD, SHEET SET, RESIN COMPOSITION FOR CORES, RESIN COMPOSITION FOR CLADDINGS, AND RESIN SHEET | 味の素株式会社 | 2023-08-03 | — | — | WO | disclosed |
| CN-110120180-B | Wiring member | JSR株式会社（JP） | 2023-01-13 | — | — | CN | disclosed |
| CN-110088680-B | Double-layer photosensitive layer roll | 旭化成株式会社 | 2022-12-30 | — | — | CN | disclosed |
| CN-107544208-B | Negative photosensitive resin composition, spacer, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2022-05-31 | — | — | CN | disclosed |
| CN-114545738-A | Positive photosensitive resin composition | 味之素株式会社 | 2022-05-27 | — | — | CN | disclosed |
| CN-114326302-A | Photosensitive resin composition | 味之素株式会社 | 2022-04-12 | — | — | CN | disclosed |
| CN-110892296-B | Composition for forming infrared-transmitting film, method for forming infrared-transmitting film, protective plate for display device, and display device | JSR株式会社 | 2022-03-22 | — | — | CN | disclosed |
| US-20100196822-A1 | PHOTOSENSITIVE INSULATING RESIN COMPOSITION, CURED PRODUCT OF THE COMPOSITION, AND METHOD OF PRODUCING INSULATING FILM | JSR CORPORATION (JP) | 2010-08-05 | — | — | US | disclosed |
| US-20100167204-A1 | RADIATION-SENSITIVE INSULATION RESIN COMPOSITION, CURED ARTICLE, AND ELECTRONIC DEVICE | JSR CORPORATION (JP) | 2010-07-01 | — | — | US | disclosed |
| US-7714033-B2 | Photosensitive insulating resin composition, cured product thereof and electronic component comprising the same | JSR CORPORATION (JP) | 2010-05-11 | — | — | US | disclosed |
| US-20090239080-A1 | PHOTOSENSITIVE INSULATION RESIN COMPOSITION AND CURED PRODUCT THEREOF | JSR CORPORATION (JP) | 2009-09-24 | — | — | US | disclosed |
| EP-1892574-A1 | Photosensitive insulating resin composition, cured product thereof and electronic component having the same | JSR Corporation (JP) | 2008-02-27 | — | — | EP | disclosed |
| US-20080045621-A1 | PHOTOSENSITIVE INSULATING RESIN COMPOSITION, CURED PRODUCT THEREOF AND ELECTRONIC COMPONENT COMPRISING THE SAME | JSR CORPORATION (JP) | 2008-02-21 | — | — | US | disclosed |
| US-20070027231-A1 | Photosensitive insulating resin composition and cured product thereof | JSR CORPORATION (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20060246371-A1 | Photosensitive fluororesin composition, cured film obtained from the composition, and method of forming pattern | JSR CORPORATION (JP) | 2006-11-02 | — | — | US | disclosed |
| EP-1666969-A1 | PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED PRODUCT THEREOF | JSR Corporation (JP) | 2006-06-07 | — | — | EP | disclosed |
| US-20040110084-A1 | Photosensitive insulating resin composition and cured product thereof | JSR CORPORATION (JP) | 2004-06-10 | — | — | US | disclosed |