SCHEMBL218870

SCHEMBL218870

CCCC(N)C(CC)CC

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.40
METAP1 P53582 2/20 0.37
OPRM1 P35372 1/20 0.33
ALDH1A1 P00352 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
CYP2D6 P10635 2/20 0.30
SPHK1 Q9NYA1 1/20 0.30
GMNN O75496 1/20 0.30
POLB P06746 1/20 0.30
THPO P40225 1/20 0.30
MTOR P42345 1/20 0.30
BLM P54132 1/20 0.30
KDM4E B2RXH2 1/20 0.30
TP53 P04637 1/20 0.30
CYP1A2 P05177 1/20 0.30
CYP3A4 P08684 1/20 0.30
MAPT P10636 1/20 0.30
CETP P11597 1/20 0.30
HTT P42858 1/20 0.30
UBE2N P61088 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4906750 0.86 ALDH1A1 (0.37) LMNAMETAP1ALDH1A1TDP1
SCHEMBL5349656 0.84 METAP1 (0.44) LMNAMETAP1OPRM1CYP2D6SPHK1
SCHEMBL8293096 0.84 ALDH1A1 (0.41) LMNAOPRM1ALDH1A1TDP1CYP2D6
SCHEMBL2874917 0.82 ALDH1A1 (0.44) LMNAOPRM1ALDH1A1TDP1CYP2D6
SCHEMBL7186111 0.81
SCHEMBL1237103 0.80 OPRM1 (0.52) LMNAOPRM1ALDH1A1TDP1CYP2D6
SCHEMBL13314190 0.80 LMNA (0.36) LMNAMETAP1OPRM1
SCHEMBL29286830 0.80 OPRM1 (0.46) LMNAOPRM1CYP2D6SPHK1GMNN
SCHEMBL29286431 0.80 OPRM1 (0.46) LMNAOPRM1CYP2D6SPHK1GMNN
SCHEMBL29173995 0.80 OPRM1 (0.46) LMNAOPRM1CYP2D6SPHK1GMNN

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 61 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112777585-B Two-dimensional composite material, preparation method and application thereof 清华大学 2022-10-04 CN claimed
US-9722224-B2 Coated separator and electrochemical device including the same SAMSUNG SDI CO., LTD. (KR) 2017-08-01 US claimed
US-20150111087-A1 COATED SEPARATOR AND ELECTROCHEMICAL DEVICE INCLUDING THE SAME SAMSUNG SDI CO., LTD. (KR) 2015-04-23 US claimed
EP-2863452-A1 Battery separation layer comprising a quaternary ammonium fluorinated salt coating material Samsung SDI Co., Ltd. (KR) 2015-04-22 EP claimed
US-5731128-A ELASTICITY, HARDNESS, ELONGATION; WATER DEVELOPABILITY NIPPON PAINT CO., LTD. (JP) 1998-03-24 US claimed
CN-110475748-B Method for producing titanium-containing silicon oxide, method for producing epoxide, and titanium-containing silicon oxide 住友化学株式会社 2022-12-30 CN disclosed
CN-112777585-B Two-dimensional composite material, preparation method and application thereof 清华大学 2022-10-04 CN disclosed
EP-2384457-B1 COATING COMPOSITIONS MERCK PATENT GMBH (DE) 2022-07-06 EP disclosed
EP-3798225-A1 ORGANOMETALLIC COMPOUND, ORGANIC LIGHT-EMITTING DEVICE INCLUDING THE SAME AND ELECTRONIC APPARATUS INCLUDING THE ORGANIC LIGHT-EMITTING DEVICE Samsung Electronics Co., Ltd. (KR) 2021-03-31 EP disclosed
EP-2072496-B1 METHOD FOR PRODUCING HIGH-PURITY QUATERNARY AMMONIUM SALT OTSUKA CHEMICAL CO LTD (JP) 2017-11-15 EP disclosed
US-9722224-B2 Coated separator and electrochemical device including the same SAMSUNG SDI CO., LTD. (KR) 2017-08-01 US disclosed
US-9146467-B2 Coating compositions MERCK PATENT GMBH (DE) 2015-09-29 US disclosed
US-5731128-A ELASTICITY, HARDNESS, ELONGATION; WATER DEVELOPABILITY NIPPON PAINT CO., LTD. (JP) 1998-03-24 US disclosed
US-5731129-A Photosensitive resin composition comprising a carboxyl group-containing diene copolymer and a hydrogenated diene block polymer JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-03-24 US disclosed
EP-0745900-A1 Water-developing photosensitive resin composition Nippon Paint Co., Ltd. (JP) 1996-12-04 EP disclosed
EP-0607962-B1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-07-17 EP disclosed
EP-0675412-A1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-10-04 EP disclosed
EP-0607962-A1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-07-27 EP disclosed
EP-0206621-B1 PROCESS FOR DISPROPORTIONATING SILANES MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-11-15 EP disclosed
EP-0206621-A1 Process for disproportionating silanes MITSUI TOATSU CHEMICALS, Inc. (JP) 1986-12-30 EP disclosed