Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | PPM1B | O75688 | 1/20 | 0.32 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.32 |
| ▸ | PPP1CC | P36873 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17320482 | 0.86 | KMT2A (0.36) | KMT2AMEN1L3MBTL1ALDH1A1GLA | |
| SCHEMBL3414738 | 0.83 | KMT2A (0.34) | KMT2AMEN1L3MBTL1ALDH1A1GLA | |
| SCHEMBL22855676 | 0.83 | KMT2A (0.34) | KMT2AMEN1L3MBTL1ALDH1A1GLA | |
| SCHEMBL14001998 | 0.83 | KMT2A (0.34) | KMT2AMEN1L3MBTL1ALDH1A1GLA | |
| SCHEMBL12014001 | 0.83 | KMT2A (0.34) | KMT2AMEN1L3MBTL1ALDH1A1GLA | |
| SCHEMBL962818 | 0.83 | KMT2A (0.34) | KMT2AMEN1L3MBTL1ALDH1A1GLA | |
| SCHEMBL11988730 | 0.83 | KMT2A (0.34) | KMT2AMEN1L3MBTL1ALDH1A1GLA | |
| SCHEMBL21567775 | 0.82 | KMT2A (0.34) | KMT2AMEN1L3MBTL1ALDH1A1GLA | |
| SCHEMBL8580888 | 0.82 | KMT2A (0.34) | KMT2AMEN1L3MBTL1ALDH1A1GLA | |
| SCHEMBL13481221 | 0.82 | ALDH1A1 (0.34) | KMT2AMEN1L3MBTL1ALDH1A1GLA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024135498-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2024-06-27 | — | — | WO | disclosed |
| WO-2024127977-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024122425-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024043098-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND INTERMEDIATE THEREOF | 東京応化工業株式会社 | 2024-02-29 | — | — | WO | disclosed |
| WO-2024043121-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND AND INTERMEDIATE THEREFOR | 東京応化工業株式会社 | 2024-02-29 | — | — | WO | disclosed |
| WO-2023223897-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2023-11-23 | — | — | WO | disclosed |
| WO-2023210520-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2023-11-02 | — | — | WO | disclosed |
| WO-2023195407-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-10-12 | — | — | WO | disclosed |
| WO-2023189961-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023176546-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND ACID GENERATOR | 東京応化工業株式会社 | 2023-09-21 | — | — | WO | disclosed |
| WO-2023140231-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | 東京応化工業株式会社 | 2023-07-27 | — | — | WO | disclosed |
| WO-2023140364-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, COMPOUND, AND POLYMER | 東京応化工業株式会社 | 2023-07-27 | — | — | WO | disclosed |
| WO-2023112893-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMATION METHOD | 東京応化工業株式会社 | 2023-06-22 | — | — | WO | disclosed |
| WO-2023068333-A1 | METHOD FOR PRODUCING ACID GENERATOR | 東京応化工業株式会社 | 2023-04-27 | — | — | WO | disclosed |
| WO-2023013592-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2023-02-09 | — | — | WO | disclosed |
| WO-2022270627-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2022-12-29 | — | — | WO | disclosed |
| WO-2022265034-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, METHOD FOR PRODUCING COMPOUNDS, INTERMEDIATE, AND COMPOUNDS | 東京応化工業株式会社 | 2022-12-22 | — | — | WO | disclosed |
| WO-2022264941-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2022-12-22 | — | — | WO | disclosed |
| WO-2022264845-A1 | RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | 東京応化工業株式会社 | 2022-12-22 | — | — | WO | disclosed |
| WO-2020054563-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | 東京応化工業株式会社 | 2020-03-19 | — | — | WO | disclosed |