SCHEMBL21933181

SCHEMBL21933181

CCCc1ccc(C=Cc2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)o1.COc1cc(C=Cc2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)cc(OC)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AHR P35869 3/20 0.38
ESR1 P03372 4/20 0.36
CYP1A1 P04798 6/20 0.36
CYP1B1 Q16678 6/20 0.36
CYP1A2 P05177 4/20 0.36
CYP24A1 Q07973 1/20 0.35
NQO2 P16083 5/20 0.35
ABL1 P00519 3/20 0.35
ABCB1 P08183 3/20 0.35
BCR P11274 3/20 0.35
TTR P02766 2/20 0.35
ALOX5 P09917 2/20 0.35
CYP19A1 P11511 2/20 0.35
PTGS2 P35354 2/20 0.35
TUBB4A P04350 1/20 0.35
TUBB P07437 1/20 0.35
TUBA3C P0DPH7 1/20 0.35
TUBA1B P68363 1/20 0.35
TUBA4A P68366 1/20 0.35
TUBB4B P68371 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21933180 1.00 AHR (0.38) AHRESR1CYP1A1CYP1B1CYP1A2
SCHEMBL499061 0.86 BRAF (0.31)
SCHEMBL499062 0.86 BRAF (0.31)
SCHEMBL17447743 0.83 CYP1A2 (0.34) CYP1B1CYP1A2
SCHEMBL17447742 0.83 CYP1A2 (0.34) CYP1B1CYP1A2
SCHEMBL498565 0.81 CYP1A1 (0.55) AHRESR1CYP1A1CYP1B1CYP1A2
SCHEMBL498564 0.81 CYP1A1 (0.55) AHRESR1CYP1A1CYP1B1CYP1A2
SCHEMBL499391 0.78 AHR (0.49) AHRESR1CYP1A1CYP1B1CYP1A2
SCHEMBL499390 0.78 AHR (0.49) AHRESR1CYP1A1CYP1B1CYP1A2
SCHEMBL29447162 0.78 AHR (0.49) AHRESR1CYP1A1CYP1B1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11754926-B2 Method of forming resist pattern, resist composition and method of producing the same TOKYO OHKA KOGYO CO., LTD. (JP) 2023-09-12 US disclosed
US-20200150541-A1 METHOD OF FORMING RESIST PATTERN, RESIST COMPOSITION AND METHOD OF PRODUCING THE SAME TOKYO OHKA KOGYO CO., LTD. (JP) 2020-05-14 US disclosed