Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A1 | P04798 | 8/20 | 0.55 |
| ▸ | CYP1B1 | Q16678 | 8/20 | 0.55 |
| ▸ | CYP1A2 | P05177 | 5/20 | 0.49 |
| ▸ | NQO2 | P16083 | 6/20 | 0.47 |
| ▸ | ABL1 | P00519 | 4/20 | 0.47 |
| ▸ | BCR | P11274 | 4/20 | 0.47 |
| ▸ | ESR1 | P03372 | 3/20 | 0.47 |
| ▸ | TTR | P02766 | 3/20 | 0.47 |
| ▸ | ALOX5 | P09917 | 3/20 | 0.47 |
| ▸ | ABCB1 | P08183 | 2/20 | 0.47 |
| ▸ | CYP19A1 | P11511 | 2/20 | 0.47 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.47 |
| ▸ | AHR | P35869 | 2/20 | 0.47 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.47 |
| ▸ | TUBB | P07437 | 1/20 | 0.47 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.47 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.47 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.47 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.47 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL498564 | 1.00 | CYP1A1 (0.55) | CYP1A1CYP1B1CYP1A2NQO2ABL1 | |
| SCHEMBL29447154 | 0.90 | ESR1 (0.54) | CYP1A1CYP1B1CYP1A2NQO2ABL1 | |
| SCHEMBL499043 | 0.90 | ESR1 (0.54) | CYP1A1CYP1B1CYP1A2NQO2ABL1 | |
| SCHEMBL499044 | 0.90 | ESR1 (0.54) | CYP1A1CYP1B1CYP1A2NQO2ABL1 | |
| SCHEMBL499390 | 0.88 | AHR (0.49) | CYP1A1CYP1B1CYP1A2NQO2ABL1 | |
| SCHEMBL499391 | 0.88 | AHR (0.49) | CYP1A1CYP1B1CYP1A2NQO2ABL1 | |
| SCHEMBL29447162 | 0.88 | AHR (0.49) | CYP1A1CYP1B1CYP1A2NQO2ABL1 | |
| SCHEMBL5185776 | 0.85 | CYP1A1 (0.49) | CYP1A1CYP1B1CYP1A2NQO2ABL1 | |
| SCHEMBL1130906 | 0.85 | RELA (0.54) | CYP1A1CYP1B1CYP1A2NQO2ABL1 | |
| SCHEMBL20450511 | 0.85 | RELA (0.54) | CYP1A1CYP1B1CYP1A2NQO2ABL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 231 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9244354-B2 | Method for producing thick film photoresist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-26 | — | — | US | claimed |
| EP-4667537-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-12-24 | — | — | EP | disclosed |
| US-20250382500-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO LTD (JP) | 2025-12-18 | — | — | US | disclosed |
| US-20250271751-A1 | PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE FILM, LOWER LAYER FILM, METHOD FOR PRODUCING STRUCTURE HAVING PHASE-SEPARATED STRUCTURE, AND COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-08-28 | — | — | US | disclosed |
| US-20250189895-A1 | METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-06-12 | — | — | US | disclosed |
| CN-120065622-A | Photosensitive resin composition and method for producing microlens | 东京应化工业株式会社 | 2025-05-30 | — | — | CN | disclosed |
| US-20250172872-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-05-29 | — | — | US | disclosed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| EP-3961676-B1 | ETCHING METHOD AND PHOTOSENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2025-01-22 | — | — | EP | disclosed |
| CN-115524923-B | Negative photosensitive resin composition, patterning method and application thereof | 深圳市容大感光科技股份有限公司 | 2024-11-19 | — | — | CN | disclosed |
| EP-1103856-A1 | Positive resist composition & process for forming resist pattern using same | Central Glass Company, Limited (JP) | 2001-05-30 | — | — | EP | disclosed |
| US-6225476-B1 | ACRYLIC ESTER COMPOUND HAVING ALKOXYCARBONYL GROUP OR GROUP DERIVED FROM MOLECULE OF LACTONE COMPOUND BY REMOVING HYDROGEN ATOM BONDED TO CARBON ATOM; MONOMER OF FILM-FORMING RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-05-01 | — | — | US | disclosed |
| US-6087063-A | Positive-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-07-11 | — | — | US | disclosed |
| US-6042988-A | ALKALI-SOLUBLE RESIN, A COMPOUND CAPABLE OF GENERATING AN ACID BY IRRADIATION AND A CROSSLINKING AGENT, AND FURTHER CONTAINS AN ORGANIC CARBOXYLIC ACID AS ACIDIC COMPOUND AND ORGANIC AMINE AS ALKALINE COMPOUND; DEFINITION AND PRECISION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-03-28 | — | — | US | disclosed |
| US-5955241-A | Chemical-amplification-type negative resist composition and method for forming negative resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-09-21 | — | — | US | disclosed |
| US-5929271-A | Compounds for use in a positive-working resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-27 | — | — | US | disclosed |
| US-5817444-A | POLYHYDROXYSTYRENE SUBSTITUTED WITH TETRAHYDROPYRAN GROUPS, POLYHYDROXYSTYRENE SUBSTITUTED WITH ALKOXYALKYL GROUPS | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-10-06 | — | — | US | disclosed |
| US-5789136-A | Negative-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-08-04 | — | — | US | disclosed |
| US-5700625-A | Negative-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-12-23 | — | — | US | disclosed |
| US-5368783-A | Novolak resin or polyhydroxystyrene resin, alkoxymethylated amino resin and triazine | TOKYO OHKA KOGYO CO., LTD. (JP) | 1994-11-29 | — | — | US | disclosed |