Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAP2K7 | O14733 | 1/20 | 0.37 |
| ▸ | CDC25A | P30304 | 1/20 | 0.37 |
| ▸ | CDC25B | P30305 | 1/20 | 0.37 |
| ▸ | S100A4 | P26447 | 3/20 | 0.37 |
| ▸ | PTPRC | P08575 | 1/20 | 0.33 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.31 |
| ▸ | MAPT | P10636 | 2/20 | 0.31 |
| ▸ | NSD2 | O96028 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.30 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22663787 | 0.82 | PTPRC (0.31) | S100A4PTPRC | |
| SCHEMBL14806830 | 0.80 | DAO (0.39) | S100A4PTPRCKDM4EMAPTNSD2 | |
| SCHEMBL21181015 | 0.79 | KDM4E (0.31) | KDM4EALDH1A1 | |
| SCHEMBL23265553 | 0.77 | MAP2K7 (0.35) | MAP2K7CDC25ACDC25BS100A4PTPRC | |
| SCHEMBL24759701 | 0.72 | CA1 (0.38) | CDC25BS100A4PTPRC | |
| SCHEMBL14488751 | 0.72 | BAZ2B (0.36) | S100A4PTPRCKDM4EALDH1A1SMN1; SMN2 | |
| SCHEMBL22965285 | 0.70 | PSIP1 (0.32) | PTPRCALDH1A1SMN1; SMN2 | |
| SCHEMBL23422727 | 0.70 | S100A4 (0.32) | MAP2K7CDC25ACDC25BS100A4PTPRC | |
| SCHEMBL18473410 | 0.70 | ALOX15 (0.33) | PTPRCALDH1A1SMN1; SMN2 | |
| SCHEMBL19221906 | 0.69 | S100A4 (0.31) | S100A4PTPRC |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3896114-B1 | POLYIMIDE RESIN AND METHOD OF PRODUCING THE SAME, PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING METHOD AND METHOD OF FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHINETSU CHEMICAL CO (JP) | 2023-10-18 | — | — | EP | disclosed |
| EP-2586806-B1 | Modified novolak phenolic resin, making method, and resist composition | SHINETSU CHEMICAL CO (JP) | 2020-04-29 | — | — | EP | disclosed |