Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | DAO | P14920 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.36 |
| ▸ | MAPT | P10636 | 2/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.36 |
| ▸ | PABPC1 | P11940 | 1/20 | 0.36 |
| ▸ | PTPRC | P08575 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | ELANE | P08246 | 2/20 | 0.34 |
| ▸ | CTSG | P08311 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.33 |
| ▸ | RAB9A | P51151 | 2/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21944745 | 0.80 | MAP2K7 (0.37) | ALDH1A1SMN1; SMN2MAPTKDM4EPABPC1 | |
| SCHEMBL5886239 | 0.80 | PTPRC (0.53) | DAOALDH1A1MEN1POLBKMT2A | |
| SCHEMBL13840595 | 0.77 | ALDH1A1 (0.42) | DAOALDH1A1MEN1POLBKMT2A | |
| SCHEMBL24759701 | 0.77 | CA1 (0.38) | MEN1KMT2APTPRCCA1CA2 | |
| SCHEMBL14488751 | 0.77 | BAZ2B (0.36) | ALDH1A1KMT2ASMN1; SMN2KDM4EPTPRC | |
| SCHEMBL22663787 | 0.76 | PTPRC (0.31) | PTPRCS100A4 | |
| SCHEMBL13434496 | 0.75 | IDO1 (0.50) | DAOALDH1A1MEN1POLBKMT2A | |
| SCHEMBL22965285 | 0.74 | PSIP1 (0.32) | ALDH1A1SMN1; SMN2PTPRC | |
| SCHEMBL18473410 | 0.74 | ALOX15 (0.33) | ALDH1A1SMN1; SMN2PTPRCL3MBTL1 | |
| SCHEMBL23422727 | 0.74 | S100A4 (0.32) | MEN1KMT2APTPRCS100A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11156873-B2 | Alignment film, liquid crystal panel, and method for producing liquid crystal panel | SHARP KABUSHIKI KAISHA (JP) | 2021-10-26 | — | — | US | disclosed |
| EP-3287495-B1 | RESIN COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT USING SAME, AND SEMICONDUCTOR DEVICE | TORAY INDUSTRIES (JP) | 2020-06-24 | — | — | EP | disclosed |
| EP-3235803-B1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | SHINETSU CHEMICAL CO (JP) | 2020-06-03 | — | — | EP | disclosed |
| US-20190106629-A1 | LIQUID CRYSTAL DISPLAY DEVICE | SHARP KABUSHIKI KAISHA (JP) | 2019-04-11 | — | — | US | disclosed |
| US-20190079357-A1 | ALIGNMENT FILM, LIQUID CRYSTAL PANEL, AND METHOD FOR PRODUCING LIQUID CRYSTAL PANEL | SHARP KABUSHIKI KAISHA (JP) | 2019-03-14 | — | — | US | disclosed |
| EP-3287495-A1 | RESIN COMPOSITION, METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT USING SAME, AND SEMICONDUCTOR DEVICE | Toray Industries, Inc. (JP) | 2018-02-28 | — | — | EP | disclosed |
| EP-3235803-A1 | TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYIMIDE PRECURSOR POLYMER AND METHOD FOR PRODUCING THE SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-10-25 | — | — | EP | disclosed |
| EP-3125274-A1 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE | Toray Industries, Inc. (JP) | 2017-02-01 | — | — | EP | disclosed |
| US-20130078389-A1 | PATTERN FORMATION METHOD | NIKON CORPORATION (JP) | 2013-03-28 | — | — | US | disclosed |
| US-20130078389-A1 | PATTERN FORMATION METHOD | NIKON CORPORATION (JP) | 2013-03-28 | — | — | US | disclosed |