Known targets — ChEMBL curated mechanism
CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D
The experimentally established mechanism targets of Benzoic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.56 |
| ▸ | DAO | P14920 | 1/20 | 0.56 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.56 |
| ▸ | SRD5A2 | P31213 | 3/20 | 0.48 |
| ▸ | CES2 | O00748 | 1/20 | 0.48 |
| ▸ | CES1 | P23141 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.46 |
| ▸ | SLC5A7 | Q9GZV3 | 1/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.42 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.42 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.42 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoic Acid SCHEMBL25434241 | 0.98 | TSHR (0.54) | TSHRDAONAPRTSRD5A2CES2 | |
| Benzoic Acid SCHEMBL29038821 | 0.96 | TSHR (0.52) | TSHRDAONAPRTSRD5A2CES2 | |
| Terephthalic Acid SCHEMBL25394010 | 0.90 | CYP3A4 (0.54) | TSHRDAONAPRTSRD5A2CES2 | |
| Benzoic Acid SCHEMBL20919825 | 0.90 | TSHR (0.45) | TSHRDAONAPRTSRD5A2CES2 | |
| Benzil SCHEMBL28412627 | 0.88 | CES2 (0.56) | TSHRCES2CES1LMNAMEN1 | |
| Choline SCHEMBL10892688 | 0.86 | LMNA (0.44) | TSHRDAONAPRTCES2CES1 | |
| Benzoic Acid SCHEMBL2196273 | 0.85 | CA2 (0.57) | TSHRCES2CES1LMNAMEN1 | |
| Benzoyl Chloride SCHEMBL3312904 | 0.85 | LMNA (0.43) | TSHRDAONAPRTCES2CES1 | |
| Paraben SCHEMBL28421545 | 0.85 | CA2 (0.59) | TSHRSRD5A2LMNAMEN1KMT2A | |
| Choline SCHEMBL11772334 | 0.85 | KMT2A (0.43) | TSHRCES2CES1LMNAMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108048421-A | The method that transfructosylase catalytic efficiency and stability are improved using choline eutectic solvent | 天津科技大学 | 2018-05-18 | — | — | CN | claimed |
| US-6462005-B1 | AQUEOUS SOLUTION CONTAINING A QUARTERNARY AMMONIUM SALT, A FLUORO COMPOUND AND OPTIONALLY AN ORGANIC SOLVENT; PROTECTING DEPOSITION FILM TO BE REMOVED; NO CORROSION OF CONDUCTIVE LAYER BEING DECONTAMINATED | TEXAS INSTRUMENTS INCORPORATED | 2002-10-08 | — | — | US | claimed |
| US-5972862-A | COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT | MITSUBISHI GAS CHEMICAL (JP) | 1999-10-26 | — | — | US | claimed |
| US-20250231492-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| EP-4333891-A1 | IONIC LIQUID FORMULATIONS FOR TREATING INFLAMMATORY AND AUTOIMMUNE DISEASES | I2O Therapeutics, Inc. (US) | 2024-03-13 | — | — | EP | disclosed |
| CN-117642180-A | Ionic liquid formulations for the treatment of inflammatory and autoimmune diseases | I2O治疗公司 | 2024-03-01 | — | — | CN | disclosed |
| US-20240067716-A1 | IONIC LIQUID FORMULATIONS FOR TREATING INFLAMMATORY AND AUTOIMMUNE DISEASES | I2O THERAPEUTICS, INC. | 2024-02-29 | — | — | US | disclosed |
| CN-116836070-A | Preparation method of epoxy resin coating based on novel choline ionic liquid modified hydrotalcite nano container | 河南大学 | 2023-10-03 | — | — | CN | disclosed |
| WO-2022235882-A1 | IONIC LIQUID FORMULATIONS FOR TREATING INFLAMMATORY AND AUTOIMMUNE DISEASES | I2O THERAPEUTICS, INC. (US) | 2022-11-10 | — | — | WO | disclosed |
| US-10748757-B2 | Thermally removable fill materials for anti-stiction applications | HONEYWELL INTERNATIONAL, INC. (US) | 2020-08-18 | — | — | US | disclosed |
| US-10544329-B2 | Polysiloxane formulations and coatings for optoelectronic applications | HONEYWELL INTERNATIONAL INC. (US) | 2020-01-28 | — | — | US | disclosed |
| WO-2008124711-A1 | COMPOSITIONS, LAYERS AND FILMS FOR OPTOELECTRONIC DEVICES, METHODS OF PRODUCTION AND USES THEREOF | HONEYWELL INTERNATIONAL INC. (US) | 2008-10-16 | — | — | WO | disclosed |
| US-20080157065-A1 | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof | HONEYWELL INTERNATIONAL INC. | 2008-07-03 | — | — | US | disclosed |
| EP-0827188-B1 | Cleaning liquid for producing semiconductor device and process for producing semiconductor device using same | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-09-17 | — | — | EP | disclosed |
| US-6462005-B1 | AQUEOUS SOLUTION CONTAINING A QUARTERNARY AMMONIUM SALT, A FLUORO COMPOUND AND OPTIONALLY AN ORGANIC SOLVENT; PROTECTING DEPOSITION FILM TO BE REMOVED; NO CORROSION OF CONDUCTIVE LAYER BEING DECONTAMINATED | TEXAS INSTRUMENTS INCORPORATED | 2002-10-08 | — | — | US | disclosed |
| US-6265309-B1 | Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same | MITSUBISHI GAS CHEMICALS CO., INC. (JP) | 2001-07-24 | — | — | US | disclosed |
| EP-0662705-B1 | Cleaning agent for semiconductor device and method for manufacturing semiconductor device | MITSUBISHI GAS CHEMICAL CO (JP) | 2000-08-23 | — | — | EP | disclosed |
| US-5972862-A | COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT | MITSUBISHI GAS CHEMICAL (JP) | 1999-10-26 | — | — | US | disclosed |
| EP-0827188-A2 | Cleaning liquid for producing semiconductor device and process for producing semiconductor device using same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-03-04 | — | — | EP | disclosed |
| EP-0662705-A2 | Cleaning agent for semiconductor device and method for manufacturing semiconductor device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1995-07-12 | — | — | EP | disclosed |