Known targets — ChEMBL curated mechanism
CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D
The experimentally established mechanism targets of Benzoic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 1/20 | 0.57 |
| ▸ | CA4 | P22748 | 1/20 | 0.57 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | SLC5A7 | Q9GZV3 | 1/20 | 0.43 |
| ▸ | CES2 | O00748 | 3/20 | 0.41 |
| ▸ | CES1 | P23141 | 3/20 | 0.41 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.40 |
| ▸ | CHRM4 | P08173 | 2/20 | 0.40 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.40 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.40 |
| ▸ | ALPL | P05186 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | ALPG | P10696 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
| ▸ | EDNRB | P24530 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoic Acid SCHEMBL16106190 | 0.92 | CA2 (0.53) | CA2CA4LMNAMEN1KMT2A | |
| Benzoic Acid SCHEMBL20919826 | 0.91 | CA2 (0.47) | CA2CA4LMNAMEN1KMT2A | |
| Terephthalic Acid SCHEMBL30148140 | 0.90 | MEN1 (0.48) | CA2CA4LMNAMEN1KMT2A | |
| Isophthalic Acid SCHEMBL30148147 | 0.87 | KMT2A (0.41) | CA2CA4LMNAMEN1KMT2A | |
| Benzoic Acid SCHEMBL31683095 | 0.85 | CA2 (0.57) | CA2CA4LMNAMEN1KMT2A | |
| Benzoic Acid SCHEMBL2196278 | 0.85 | TSHR (0.56) | LMNAMEN1KMT2ACYP3A4SLC5A7 | |
| Benzil SCHEMBL28412627 | 0.85 | CES2 (0.56) | LMNAMEN1KMT2ACYP3A4SLC5A7 | |
| Benzoic Acid SCHEMBL25434241 | 0.83 | TSHR (0.54) | LMNAMEN1KMT2ACYP3A4SLC5A7 | |
| Choline SCHEMBL10892688 | 0.83 | LMNA (0.44) | LMNAMEN1KMT2ACYP3A4SLC5A7 | |
| Phthalic Acid SCHEMBL7100569 | 0.83 | MEN1 (0.44) | CA2CA4LMNAMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108048421-A | The method that transfructosylase catalytic efficiency and stability are improved using choline eutectic solvent | 天津科技大学 | 2018-05-18 | — | — | CN | claimed |
| US-6462005-B1 | AQUEOUS SOLUTION CONTAINING A QUARTERNARY AMMONIUM SALT, A FLUORO COMPOUND AND OPTIONALLY AN ORGANIC SOLVENT; PROTECTING DEPOSITION FILM TO BE REMOVED; NO CORROSION OF CONDUCTIVE LAYER BEING DECONTAMINATED | TEXAS INSTRUMENTS INCORPORATED | 2002-10-08 | — | — | US | claimed |
| US-5972862-A | COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT | MITSUBISHI GAS CHEMICAL (JP) | 1999-10-26 | — | — | US | claimed |
| WO-2026106933-A1 | BIOFOAM AND RIGID BIOMATERIAL FORMULATIONS AND PROCESSES OF USING THE SAME TO PRODUCE BIODEGRADABLE PRODUCTS | BIOCHOSEN, INC. (US) | 2026-05-21 | — | — | WO | disclosed |
| US-20250231492-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| CN-119816784-A | Fabrication of integrated circuits using positive photo-patternable dielectrics comprising high silicon content polysilsesquioxanes | 潍坊星泰克微电子材料有限公司 | 2025-04-11 | — | — | CN | disclosed |
| EP-4508495-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | Suntific Materials (Weifang), Ltd. (CN) | 2025-02-19 | — | — | EP | disclosed |
| WO-2025000535-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG), LTD. (CN) | 2025-01-02 | — | — | WO | disclosed |
| EP-4333891-A1 | IONIC LIQUID FORMULATIONS FOR TREATING INFLAMMATORY AND AUTOIMMUNE DISEASES | I2O Therapeutics, Inc. (US) | 2024-03-13 | — | — | EP | disclosed |
| CN-117642180-A | Ionic liquid formulations for the treatment of inflammatory and autoimmune diseases | I2O治疗公司 | 2024-03-01 | — | — | CN | disclosed |
| US-20240067716-A1 | IONIC LIQUID FORMULATIONS FOR TREATING INFLAMMATORY AND AUTOIMMUNE DISEASES | I2O THERAPEUTICS, INC. | 2024-02-29 | — | — | US | disclosed |
| US-6462005-B1 | AQUEOUS SOLUTION CONTAINING A QUARTERNARY AMMONIUM SALT, A FLUORO COMPOUND AND OPTIONALLY AN ORGANIC SOLVENT; PROTECTING DEPOSITION FILM TO BE REMOVED; NO CORROSION OF CONDUCTIVE LAYER BEING DECONTAMINATED | TEXAS INSTRUMENTS INCORPORATED | 2002-10-08 | — | — | US | disclosed |
| US-6265309-B1 | Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same | MITSUBISHI GAS CHEMICALS CO., INC. (JP) | 2001-07-24 | — | — | US | disclosed |
| EP-0662705-B1 | Cleaning agent for semiconductor device and method for manufacturing semiconductor device | MITSUBISHI GAS CHEMICAL CO (JP) | 2000-08-23 | — | — | EP | disclosed |
| US-5972862-A | COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT | MITSUBISHI GAS CHEMICAL (JP) | 1999-10-26 | — | — | US | disclosed |
| EP-0827188-A2 | Cleaning liquid for producing semiconductor device and process for producing semiconductor device using same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1998-03-04 | — | — | EP | disclosed |
| EP-0662705-A2 | Cleaning agent for semiconductor device and method for manufacturing semiconductor device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1995-07-12 | — | — | EP | disclosed |
| US-4340698-A | CHOLINE COMPOUND CATALYST | INTERNATIONALE OCTROOI MAATSCHAPPIJ "OCTROPA" B.V. (NL) | 1982-07-20 | — | — | US | disclosed |
| EP-0010805-B1 | POWDER COATING, PROCESS FOR THE PREPARATION THEREOF AND ARTICLES COATED THEREWITH | UNILEVER N.V. (NL) | 1982-02-10 | — | — | EP | disclosed |
| EP-0010805-A1 | Powder coating, process for the preparation thereof and articles coated therewith | UNILEVER N.V. (NL) | 1980-05-14 | — | — | EP | disclosed |