SCHEMBL22006266

SCHEMBL22006266

C=C(C)C(=O)OC1(c2ccc(C(C)(C)C)cc2)CCCC1

nearest known ligand 0.36

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.36
SRD5A2 P31213 1/20 0.35
SMN1; SMN2 Q16637 5/20 0.35
HTT P42858 3/20 0.35
NPC1 O15118 2/20 0.35
RAB9A P51151 2/20 0.35
MAPT P10636 2/20 0.35
SLC6A2 P23975 2/20 0.35
KMT2A Q03164 2/20 0.34
ALDH1A1 P00352 2/20 0.34
MEN1 O00255 1/20 0.34
FAAH O00519 1/20 0.34
HDAC1 Q13547 1/20 0.33
LMNA P02545 1/20 0.32
HPGD P15428 1/20 0.32
DHODH Q02127 1/20 0.32
SIRT1 Q96EB6 1/20 0.32
TP53 P04637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22017327 0.99 SMN1; SMN2 (0.37) HSD11B1SRD5A2SMN1; SMN2HTTNPC1
SCHEMBL25905311 0.87 HSD11B1 (0.36) HSD11B1SMN1; SMN2HTTNPC1RAB9A
SCHEMBL25564666 0.87 SLC6A3 (0.40) SRD5A2HTTMAPTSLC6A2KMT2A
SCHEMBL25698983 0.84 ESR2 (0.42) HTTMAPTKMT2AALDH1A1MEN1
SCHEMBL10062522 0.84 CA1 (0.38) HSD11B1SMN1; SMN2HTTMAPTSLC6A2
SCHEMBL25960355 0.82 OPRM1 (0.35) KMT2ALMNA
SCHEMBL10062521 0.82 CA1 (0.38) SMN1; SMN2HTTMAPTKMT2AALDH1A1
SCHEMBL25564653 0.82 HSD11B1 (0.41) HSD11B1SMN1; SMN2MAPTSLC6A2ALDH1A1
SCHEMBL13347349 0.82 AKR1C1 (0.43) KMT2AALDH1A1MEN1
SCHEMBL17914408 0.81 HRH3 (0.35) KMT2AMEN1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230185192-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-06-15 US disclosed
US-20230185192-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-06-15 US disclosed
US-20210157234-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2021-05-27 US disclosed
US-20200159118-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN TOKYO OHKA KOGYO CO., LTD. (JP) 2020-05-21 US disclosed