Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 8/20 | 0.40 |
| ▸ | RECQL | P46063 | 7/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.40 |
| ▸ | MAPT | P10636 | 7/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.40 |
| ▸ | APEX1 | P27695 | 4/20 | 0.40 |
| ▸ | BLM | P54132 | 4/20 | 0.40 |
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.40 |
| ▸ | MTOR | P42345 | 2/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.40 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.40 |
| ▸ | THPO | P40225 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | SHBG | P04278 | 1/20 | 0.39 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | CACNA1C | Q13936 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3865902 | 0.83 | GAA (0.47) | TDP1KDM4EMAPTKMT2AALOX15 | |
| SCHEMBL2203936 | 0.83 | GAA (0.54) | MAPTKMT2ABLMTSHRNFKB1 | |
| SCHEMBL30375493 | 0.83 | GAA (0.54) | MAPTKMT2ABLMTSHRNFKB1 | |
| SCHEMBL2202882 | 0.82 | ESR1 (0.39) | TDP1MAPTLMNAALOX15TRPA1 | |
| SCHEMBL9009311 | 0.80 | TDP1 (0.43) | TDP1RECQLKDM4EMAPTKMT2A | |
| SCHEMBL2203238 | 0.79 | GAA (0.58) | MAPTKMT2ALMNATSHRMEN1 | |
| SCHEMBL2307444 | 0.78 | ALDH1A1 (0.44) | KDM4EKMT2ABLMLMNATSHR | |
| SCHEMBL2201624 | 0.77 | TRPA1 (0.47) | TDP1RECQLKDM4EMAPTKMT2A | |
| SCHEMBL36227 | 0.74 | TDP1 (0.44) | TDP1RECQLKDM4EMAPTKMT2A | |
| SCHEMBL29373036 | 0.74 | TDP1 (0.44) | TDP1RECQLKDM4EMAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1623274-A2 | PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2006-02-08 | — | — | EP | claimed |
| WO-2004088423-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2004-10-14 | — | — | WO | claimed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | claimed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | claimed |
| CN-113785023-B | Water-based ink composition for reversible thermochromic writing instrument, refill for refill and water-based ballpoint pen incorporating same | 株式会社百乐 | 2023-05-12 | — | — | CN | disclosed |
| US-11640110-B2 | Resin composition, method for producing heat-resistant resin film, and display device | TORAY INDUSTRIES, INC. (JP) | 2023-05-02 | — | — | US | disclosed |
| US-11333976-B2 | Resin, photosensitive resin composition, electronic component and display device using the same | TORAY INDUSTRIES, INC. (JP) | 2022-05-17 | — | — | US | disclosed |
| US-20200192227-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2020-06-18 | — | — | US | disclosed |
| US-20180011402-A1 | RESIN, PHOTOSENSITIVE RESIN COMPOSITION, ELECTRONIC COMPONENT AND DISPLAY DEVICE USING THE SAME | TORAY INDUSTRIES, INC. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-20170299965-A1 | RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE | TORAY INDUSTRIES, INC. (JP) | 2017-10-19 | — | — | US | disclosed |
| EP-1630605-B1 | PHOTOSENSITIVE RESIN COMPOSITION | TORAY INDUSTRIES (JP) | 2017-10-11 | — | — | EP | disclosed |
| US-9633848-B2 | Photosensitive resin composition, method for producing patterned cured film, semiconductor element and electronic device | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2017-04-25 | — | — | US | disclosed |
| US-6929890-B2 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2005-08-16 | — | — | US | disclosed |
| US-20050014876-A1 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2005-01-20 | — | — | US | disclosed |
| EP-1496395-A2 | Photosensitive resin precursor composition | TORAY INDUSTRIES, INC. (JP) | 2005-01-12 | — | — | EP | disclosed |
| EP-1475665-A1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-20040197703-A1 | Positive-type photosensitive resin composition | TORAY INDUSTRIES, INC. (JP) | 2004-10-07 | — | — | US | disclosed |
| US-20040197704-A1 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. | 2004-10-07 | — | — | US | disclosed |
| US-6790582-B1 | NOVOLAK RESIN PARTIALLY ESTERIFIED WITH NAPHTHOQUINONEDIAZIDOSULFONYL GROUP; DILUTION RESIN(S), AND SOLVENT | CLARIANT FINANCE BVI LIMITED (VG) | 2004-09-14 | — | — | US | disclosed |
| EP-1146394-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR IMPROVING DRY ETCHING RESISTANCE OF PHOTOSENSITIVE RESIN COMPOSITION | CLARIANT INTERNATIONAL LTD. (CH) | 2001-10-17 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180011402-A1 | RESIN, PHOTOSENSITIVE RESIN COMPOSITION, ELECTRONIC COMPONENT AND DISPLAY DEVICE USING THE SAME | EED, RPL19, RARA | TDP1 2239/4885RECQL 740/4885KDM4E 1157/4885 |
| US-11333976-B2 | Resin, photosensitive resin composition, electronic component and display device using the same | EED, RPL19, RARA | TDP1 2239/4885RECQL 740/4885KDM4E 1157/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.