SCHEMBL2202971

SCHEMBL2202971

CC(C)c1cc(C(c2ccc(O)c(C(C)C)c2)c2ccccc2O)ccc1O

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRA1 P14867 3/20 0.61
GABRB2 P47870 3/20 0.61
TSHR P16473 3/20 0.46
HIF1A Q16665 5/20 0.45
CYP1A2 P05177 3/20 0.45
ALOX12 P18054 3/20 0.45
TP53 P04637 2/20 0.45
LMNA P02545 4/20 0.42
CYP3A4 P08684 3/20 0.42
CA1 P00915 2/20 0.42
CA2 P00918 2/20 0.42
HPGD P15428 2/20 0.42
BLM P54132 2/20 0.42
PTGS1 P23219 2/20 0.42
SLC6A2 P23975 2/20 0.42
HTR2B P41595 2/20 0.42
FAAH O00519 1/20 0.42
GABRB1 P18505 1/20 0.42
GABRG2 P18507 1/20 0.42
HTR2C P28335 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30374786 1.00 GABRA1 (0.61) GABRA1GABRB2TSHRHIF1ACYP1A2
SCHEMBL1758097 0.94 GABRA1 (0.57) GABRA1GABRB2TSHRHIF1ACYP1A2
SCHEMBL9818054 0.85 GABRA1 (0.50) GABRA1GABRB2TSHRHIF1ACYP1A2
SCHEMBL1758832 0.84 GABRA1 (0.47) GABRA1GABRB2TSHRHIF1ACYP1A2
SCHEMBL8153198 0.83 GABRA1 (0.47) GABRA1GABRB2TSHRHIF1ACYP1A2
SCHEMBL28961780 0.82 GABRA1 (0.45) GABRA1GABRB2TSHRHIF1ACYP1A2
SCHEMBL8022318 0.82 GABRA1 (0.57) GABRA1GABRB2TSHRHIF1ACYP1A2
SCHEMBL759633 0.81 GABRA1 (0.45) GABRA1GABRB2TSHRHIF1ACYP1A2
SCHEMBL29375022 0.81 GABRA1 (0.45) GABRA1GABRB2TSHRHIF1ACYP1A2
SCHEMBL2202076 0.81 TDP1 (0.53) GABRA1GABRB2TSHRHIF1ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-11035509-A None JP disclosed
US-11640110-B2 Resin composition, method for producing heat-resistant resin film, and display device TORAY INDUSTRIES, INC. (JP) 2023-05-02 US disclosed
US-11333976-B2 Resin, photosensitive resin composition, electronic component and display device using the same TORAY INDUSTRIES, INC. (JP) 2022-05-17 US disclosed
US-20200192227-A1 RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2020-06-18 US disclosed
US-20180011402-A1 RESIN, PHOTOSENSITIVE RESIN COMPOSITION, ELECTRONIC COMPONENT AND DISPLAY DEVICE USING THE SAME TORAY INDUSTRIES, INC. (JP) 2018-01-11 US disclosed
US-20170299965-A1 RESIN COMPOSITION, METHOD FOR PRODUCING HEAT-RESISTANT RESIN FILM, AND DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2017-10-19 US disclosed
EP-1630605-B1 PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES (JP) 2017-10-11 EP disclosed
EP-1496395-B1 Photosensitive resin precursor composition TORAY INDUSTRIES (JP) 2012-06-20 EP disclosed
EP-1862855-B1 PHOTOSENSITIVE RESIN COMPOSITION TORAY INDUSTRIES (JP) 2011-10-05 EP disclosed
US-20110193244-A1 ADHESIVE FILM AND PROCESS FOR PREPARING THE SAME AS WELL AS ADHESIVE SHEET AND SEMICONDUCTOR DEVICE MASUKO TAKASHI 2011-08-11 US disclosed
EP-1630605-A1 PHOTOSENSITIVE RESIN COMPOSITION, AND ELECTRONIC COMPONENT AND DISPLAY USING SAME TORAY INDUSTRIES, INC. (JP) 2006-03-01 EP disclosed
US-6929890-B2 Positive-type photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2005-08-16 US disclosed
US-20050014876-A1 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2005-01-20 US disclosed
EP-1496395-A2 Photosensitive resin precursor composition TORAY INDUSTRIES, INC. (JP) 2005-01-12 EP disclosed
EP-1475665-A1 Positive-type photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2004-11-10 EP disclosed
US-20040197703-A1 Positive-type photosensitive resin composition TORAY INDUSTRIES, INC. (JP) 2004-10-07 US disclosed
US-20030062630-A1 Adhesive film for semiconductor, lead frame with adhesive film for semiconductor and semiconductor device using the same HITACHI CHEMICAL CO., LTD. (JP) 2003-04-03 US disclosed
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed
JP-H1135509-A NEW POLYPHENOL COMPOUND HONSHU CHEM IND CO LTD 1999-02-09 JP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180011402-A1 RESIN, PHOTOSENSITIVE RESIN COMPOSITION, ELECTRONIC COMPONENT AND DISPLAY DEVICE USING THE SAME EED, RPL19, RARA GABRA1 1176/4885GABRB2 2483/4885TSHR 3566/4885
US-11333976-B2 Resin, photosensitive resin composition, electronic component and display device using the same EED, RPL19, RARA GABRA1 1176/4885GABRB2 2483/4885TSHR 3566/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.